Two-Dimensional Pattern Formation Using Graphoepitaxy of PS‑b‑PMMA Block Copolymers for Advanced FinFET Device and Circuit Fabrication
Tsai, Hsinyu, Pitera, Jed W, Miyazoe, Hiroyuki, Bangsaruntip, Sarunya, Engelmann, Sebastian U, Liu, Chi-Chun, Cheng, Joy Y, Bucchignano, James J, Klaus, David P, Joseph, Eric A, Sanders, Daniel P, Colburn, Matthew E, Guillorn, Michael A
Published in ACS nano (27.05.2014)
Published in ACS nano (27.05.2014)
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Journal Article
Electrical characterization of FinFETs with fins formed by directed self assembly at 29 nm fin pitch using a self-aligned fin customization scheme
Hsinyu Tsai, Miyazoe, Hiroyuki, Chang, Josephine B., Pitera, Jed, Chi-Chun Liu, Brink, Markus, Lauer, Isaac, Cheng, Joy Y., Engelmann, Sebastian, Rozen, John, Bucchignano, James J., Klaus, David P., Dawes, Simon, Gignac, Lynne, Breslin, Chris, Joseph, Eric A., Sanders, Daniel P., Colburn, Matthew E., Guillorn, Michael A.
Published in 2014 IEEE International Electron Devices Meeting (01.12.2014)
Published in 2014 IEEE International Electron Devices Meeting (01.12.2014)
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Conference Proceeding
DISPOSABLE CARBON-BASED TEMPLATE LAYER FOR FORMATION OF BORDERLESS CONTACT STRUCTURES
GUILLORN MICHAEL A, ENGELMANN SEBASTIAN U, BREYTA GREGORY, KLAUS DAVID P, PYZYNA ADAM M, CHANG JOSEPHINE B
Year of Publication 20.02.2014
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Year of Publication 20.02.2014
Patent
DISPOSABLE CARBON-BASED TEMPLATE LAYER FOR FORMATION OF BORDERLESS CONTACT STRUCTURES
GUILLORN MICHAEL A, ENGELMANN SEBASTIAN U, BREYTA GREGORY, KLAUS DAVID P, PYZYNA ADAM M, CHANG JOSEPHINE B
Year of Publication 20.02.2014
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Year of Publication 20.02.2014
Patent
High resolution silicon-containing resist
Bucchignano, James J, Huang, Wu-Song S, Klaus, David P, Sekaric, Lidija, Viswanathan, Raman G
Year of Publication 09.02.2010
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Year of Publication 09.02.2010
Patent
High resolution silicon-containing resist
VISWANATHAN RAMAN G, HUANG WU-SONG S, SEKARIC LIDIJA, KLAUS DAVID P, BUCCHIGNANO JAMES J
Year of Publication 09.02.2010
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Year of Publication 09.02.2010
Patent
Method for using negative tone silicon-containing resist for e-beam lithography
Huang, Wu-Song S, Sekaric, Lidija, Bucchignano, James J, Klaus, David P, Viswanathan, Raman
Year of Publication 15.07.2008
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Year of Publication 15.07.2008
Patent
Method for using negative tone silicon-containing resist for e-beam lithography
HUANG WU-SONG S, SEKARIC LIDIJA, VISWANATHAN RAMAN, KLAUS DAVID P, BUCCHIGNANO JAMES J
Year of Publication 15.07.2008
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Year of Publication 15.07.2008
Patent
NEGATIVE TONE SILICON-CONTAINING RESIST FOR E-BEAM LITHOGRAPHY
HUANG WU-SONG S, SEKARIC LIDIJA, VISWANATHAN RAMAN, KLAUS DAVID P, BUCCHIGNANO JAMES J
Year of Publication 01.05.2008
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Year of Publication 01.05.2008
Patent
High resolution silicon-containing resist
VISWANATHAN RAMAN G, HUANG WU-SONG S, SEKARIC LIDIJA, KLAUS DAVID P, BUCCHIGNANO JAMES J
Year of Publication 07.12.2006
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Year of Publication 07.12.2006
Patent
Resist composition and using method thereof
VISWANATHAN RAMAN G, HUANG WU-SONG S, SEKARIC LIDIJA, KLAUS DAVID P, BUCCHIGNANO JAMES J
Year of Publication 08.12.2010
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Year of Publication 08.12.2010
Patent
High resolution silicon-containing resist
SEKARIC, LIDIJA, VISWANATHAN, RAMAN G, HUANG, WU-SONG S, BUCCHIGNANO, JAMES J, KLAUS, DAVID P
Year of Publication 01.04.2007
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Year of Publication 01.04.2007
Patent