Excited helium-induced CVD of a-Si 1− xC x:H films from trimethylchlorosilane
Smirnova, T.P., Yakovkina, L.V., Ayupov, B.M, Dolgpvesova, I.P., Nadolinny, V.A., Kitchay, V.N.
Published in Thin solid films (1999)
Published in Thin solid films (1999)
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Journal Article
Excited helium-induced CVD of a-Si1−xCx:H films from trimethylchlorosilane
Smirnova, T.P., Yakovkina, L.V., Ayupov, B.M, Dolgpvesova, I.P., Nadolinny, V.A., Kitchay, V.N.
Published in Thin solid films (29.09.1999)
Published in Thin solid films (29.09.1999)
Get full text
Journal Article