Mn2O3 Slurry Reuse by Circulation Achieving High Constant Removal Rate
Kishii, Sadahiro, Nakamura, Ko, Hanawa, Kenzo, Watanabe, Satoru, Arimoto, Yoshihiro, Kurokawa, Syuhei, Doi, Toshiro K
Published in Jpn J Appl Phys (01.04.2012)
Published in Jpn J Appl Phys (01.04.2012)
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Journal Article
Tungsten Film Chemical Mechanical Polishing Using MnO2 Slurry
Kishii, Sadahiro, Hatada, Akiyoshi, Arimoto, Yoshihiro, Kurokawa, Syuhei, Doi, Toshiro K
Published in Jpn J Appl Phys (01.07.2011)
Published in Jpn J Appl Phys (01.07.2011)
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Journal Article
Reconditioning-free polishing for interlayer-dielectric planarization
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Conference Proceeding
Journal Article
Mn2O3 Slurry Achieving Reduction of Slurry Waste
Kishii, Sadahiro, Nakamura, Ko, Hanawa, Kenzo, Watanabe, Satoru, Arimoto, Yoshihiro, Kurokawa, Syuhei, Doi, Toshiro K
Published in Jpn J Appl Phys (01.04.2012)
Published in Jpn J Appl Phys (01.04.2012)
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Journal Article
Mn 2 O 3 Slurry Achieving Reduction of Slurry Waste
Kishii, Sadahiro, Nakamura, Ko, Hanawa, Kenzo, Watanabe, Satoru, Arimoto, Yoshihiro, Kurokawa, Syuhei, Doi, Toshiro K.
Published in Japanese Journal of Applied Physics (01.04.2012)
Published in Japanese Journal of Applied Physics (01.04.2012)
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Journal Article
Mn 2 O 3 Slurry Achieving Reduction of Slurry Waste
Kishii, Sadahiro, Nakamura, Ko, Hanawa, Kenzo, Watanabe, Satoru, Arimoto, Yoshihiro, Kurokawa, Syuhei, Doi, Toshiro K.
Published in Japanese Journal of Applied Physics (01.04.2012)
Published in Japanese Journal of Applied Physics (01.04.2012)
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Journal Article
Dielectric SiO 2 Planarization Using MnO 2 Slurry
Kishii, Sadahiro, Nakamura, Ko, Hanawa, Kenzo, Watanabe, Satoru, Arimoto, Yoshihiro, Kurokawa, Syuhei, Doi, Toshiro K.
Published in Japanese Journal of Applied Physics (01.01.2012)
Published in Japanese Journal of Applied Physics (01.01.2012)
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Journal Article
Dielectric SiO 2 Planarization Using MnO 2 Slurry
Kishii, Sadahiro, Nakamura, Ko, Hanawa, Kenzo, Watanabe, Satoru, Arimoto, Yoshihiro, Kurokawa, Syuhei, Doi, Toshiro K.
Published in Japanese Journal of Applied Physics (01.01.2012)
Published in Japanese Journal of Applied Physics (01.01.2012)
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Journal Article
Tungsten Film Chemical Mechanical Polishing Using MnO 2 Slurry
Kishii, Sadahiro, Hatada, Akiyoshi, Arimoto, Yoshihiro, Kurokawa, Syuhei, Doi, Toshiro K.
Published in Japanese Journal of Applied Physics (01.07.2011)
Published in Japanese Journal of Applied Physics (01.07.2011)
Get full text
Journal Article
Tungsten Film Chemical Mechanical Polishing Using MnO 2 Slurry
Kishii, Sadahiro, Hatada, Akiyoshi, Arimoto, Yoshihiro, Kurokawa, Syuhei, Doi, Toshiro K.
Published in Japanese Journal of Applied Physics (01.07.2011)
Published in Japanese Journal of Applied Physics (01.07.2011)
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Journal Article
ELECTRONIC APPARATUS AND MANUFACTURING METHOD OF THE SAME
IKEDA JUNYA, NAKADA YOSHIHIRO, KIKUCHI RYO, TSUCHIDE AKIRA, KISHII SADAHIRO, SUDA SHOICHI
Year of Publication 15.12.2014
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Year of Publication 15.12.2014
Patent