Hot-Carrier-Degradation Characterization for Accurate End-of-Life Prediction with 3nm GAA Logic Technology Featuring Multi-Bridge-Channel FET
Kim, Seongkyung, Jeong, Junkyo, Choi, Eunyu, Kim, Jinyoung, Shim, Hyewon, Chung, Shinyoung, Jung, Paul
Published in 2024 IEEE Symposium on VLSI Technology and Circuits (VLSI Technology and Circuits) (16.06.2024)
Published in 2024 IEEE Symposium on VLSI Technology and Circuits (VLSI Technology and Circuits) (16.06.2024)
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Conference Proceeding
Reliability Assessment of 3nm GAA Logic Technology Featuring Multi-Bridge-Channel FETs
Kim, Seongkyung, Park, Hyerim, Choi, Eunyu, Kim, Young Han, Kim, Dahyub, Shim, Hyewon, Chung, Shinyoung, Jung, Paul
Published in 2023 IEEE International Reliability Physics Symposium (IRPS) (01.03.2023)
Published in 2023 IEEE International Reliability Physics Symposium (IRPS) (01.03.2023)
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Conference Proceeding
Middle-of-the-Line Reliability Characterization of Recessed-Diffusion-Contact Adopted sub-5nm Logic Technology
Kim, Seongkyung, Jung, Ukjin, Choo, Seungjin, Choi, Kihyun, Chung, Taejin, Chung, Shinyoung, Lee, Euncheol, Park, Juhun, Bae, Deokhan, Um, Myungyoon
Published in 2022 IEEE International Reliability Physics Symposium (IRPS) (01.03.2022)
Published in 2022 IEEE International Reliability Physics Symposium (IRPS) (01.03.2022)
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Conference Proceeding
Impact of thermal oxidation pressure and temperature on deactivation of the interfacial trap states in Al 2 O 3 /GaAs MOS capacitor: Interfacial trap states in Al 2 O 3 /GaAs MOS capacitor
Lim, Hajin, Kim, Seongkyung, Kim, Joon Rae, Song, Ji Hun, Lee, Nae-In, Jeong, Jae Kyeong, Kim, Hyeong Joon
Published in Physica status solidi. A, Applications and materials science (01.09.2015)
Published in Physica status solidi. A, Applications and materials science (01.09.2015)
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Journal Article
Impact of thermal oxidation pressure and temperature on deactivation of the interfacial trap states in Al sub(2)O sub(3)/GaAs MOS capacitor
Lim, Hajin, Kim, Seongkyung, Kim, Joon Rae, Song, Ji Hun, Lee, Nae-In, Jeong, Jae Kyeong, Kim, Hyeong Joon
Published in Physica status solidi. A, Applications and materials science (01.09.2015)
Published in Physica status solidi. A, Applications and materials science (01.09.2015)
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Journal Article
Impact of thermal oxidation pressure and temperature on deactivation of the interfacial trap states in Al2O3/GaAs MOS capacitor
Lim, Hajin, Kim, Seongkyung, Kim, Joon Rae, Song, Ji Hun, Lee, Nae-In, Jeong, Jae Kyeong, Kim, Hyeong Joon
Published in Physica status solidi. A, Applications and materials science (01.09.2015)
Published in Physica status solidi. A, Applications and materials science (01.09.2015)
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Journal Article
Reduction in the Interfacial Trap Density of Al2O3/GaAs Gate Stack by Adopting High Pressure Oxidation
Lim, Hajin, Kim, Seongkyung, Kim, Joon Rae, Suh, Sungin, Song, Ji Hun, Lee, Nae-In, Jeong, Jae Kyeong, Kim, Hyeong Joon
Published in ECS journal of solid state science and technology (01.01.2014)
Published in ECS journal of solid state science and technology (01.01.2014)
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Journal Article
Reduction in the Interfacial Trap Density of Al 2 O 3 /GaAs Gate Stack by Adopting High Pressure Oxidation
Lim, Hajin, Kim, Seongkyung, Kim, Joon Rae, Suh, Sungin, Song, Ji Hun, Lee, Nae-In, Jeong, Jae Kyeong, Kim, Hyeong Joon
Published in ECS journal of solid state science and technology (2014)
Published in ECS journal of solid state science and technology (2014)
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Journal Article