Effect of hydrogen addition on the preferred orientation of aluminum nitride films prepared by reactive sputtering
Lee, H-C B A K A I O S A T, Lee, K-Y B A K A I O S A T, Yong, Y-J B A K A I O S A T, Lee, J-Y B A K A I O S A T, Kim, G-H B A A F D D
Published in Thin solid films (15.12.1995)
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Published in Thin solid films (15.12.1995)
Journal Article