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Year of Publication 06.08.2014
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Fluorinated photoresist materials with improved etch resistant properties
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Year of Publication 15.05.2007
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Year of Publication 08.08.2006
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Year of Publication 08.08.2006
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193nm resist with improved post-exposure properties
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Year of Publication 08.08.2006
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Year of Publication 08.08.2006
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TOP ANTIREFLECTIVE COATING COMPOSITION CONTAINING HYDROPHOBIC AND ACIDIC GROUPS
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Year of Publication 07.02.2008
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Fluorinated photoresist materials with improved etch resistant properties
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Year of Publication 18.05.2006
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Year of Publication 18.05.2006
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Year of Publication 18.05.2006
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Year of Publication 18.05.2006
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NEW HEXAFLUOROALCOHOL-BASED MONOMERS AND PROCESSES OF PREPARATION THEREOF
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Year of Publication 18.05.2006
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Year of Publication 18.05.2006
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