CD-TEM: Characterizing impact of TEM sample preparation on CD metrology
Kenslea, Anne, Hakala, Chris, Zhong, Zhenxin, Lu, Yinggang, Fretwell, John, Hager, Jack, Kang, Chris, Tan, Haiyan, Weng, Weihao, Dumas, Laurent, Brooks, Irene
Published in 2018 29th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC) (01.04.2018)
Published in 2018 29th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC) (01.04.2018)
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Conference Proceeding
CD metrology for EUV lithography and etch
Johanesen, Hayley, Kenslea, Anne, Williamson, Mark, Knowles, Matt, Kwakman, Laurens, Levi, Shimon, Nishry, Noam, Adan, Ofer, Englard, Ilan, Van Puymbroeck, Jan, Felder, Dan, Gov, Shahar, Cohen, Oded, Turovets, Igor
Published in 2015 26th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC) (01.05.2015)
Published in 2015 26th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC) (01.05.2015)
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Conference Proceeding