Hf-Silicidation Reactions due to Vacuum Annealing for Poly-Si/ HfSiO(N)/ SiON/ Si Gate Stack Studied by Photoemission Spectroscopy
Kamada, Hiroyuki, Tanimura, Tatsuhiko, Toyoda, Satoshi, Kumigashira, Hiroshi, Oshima, Masaharu, Ikeda, Kazuhito, Liu, Guo Lin, Liu, Z
Published in Meeting abstracts (Electrochemical Society) (05.05.2008)
Published in Meeting abstracts (Electrochemical Society) (05.05.2008)
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Journal Article
Substrate processing apparatus and substrate processing method
Ikeda, Kazuhito, Nishitani, Eisuke, Sakuma, Harunobu, Nakagomi, Kazuhiro
Year of Publication 05.04.2005
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Year of Publication 05.04.2005
Patent