Ionic Liquid for Directed Self-Assembly of PS-b-PMMA
Kawaue, Akiya, Matsumiya, Tasuku, Seo, Takehito, Maehashi, Takaya, Seshimo, Takehiro, Yamano, Hitoshi, Miyagi, Ken, Dazai, Takahiro, Chen, Xuanxuan, Rincon-Delgadillo, Paulina, Gronheid, Roel, Nealey, Paul F., Ohmori, Katsumi
Published in Journal of Photopolymer Science and Technology (01.01.2016)
Published in Journal of Photopolymer Science and Technology (01.01.2016)
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Studies of the Photo Acid Generator Material Design for Chemically Amplified Photoresists
Utsumi, Yoshiyuki, Seshimo, Takehiro, Komuro, Yoshitaka, Kawaue, Akiya, Ishiduka, Keita, Matsuzawa, Kensuke, Hada, Hideo, Onodera, Junichi
Published in Japanese Journal of Applied Physics (01.06.2009)
Published in Japanese Journal of Applied Physics (01.06.2009)
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CHEMICALLY AMPLIFIED POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE DRY FILM, METHOD FOR PRODUCING PHOTOSENSITIVE DRY FILM, METHOD FOR PRODUCING PATTERNED RESIST FILM, METHOD FOR PRODUCING SUBSTRATE PROVIDED WITH TEMPLATE, AND METHOD FOR PRODUCING PLATED MODELED OBJECT
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Patent
Study of PAG Material Design for ArF Immersion Photoresist
Utsumi, Yoshiyuki, Komoro, Yoshitaka, Kawaue, Akira, Seshimo, Takehiro, Hada, Hideo, Nakamura, Tsuyoshi, Yoshii, Yasuhiro, Onodera, Junichi, Ogawa, Satoshi
Published in Journal of Photopolymer Science and Technology (01.01.2008)
Published in Journal of Photopolymer Science and Technology (01.01.2008)
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Journal Article