Study of PAG Material Design for ArF Immersion Photoresist
Utsumi, Yoshiyuki, Komoro, Yoshitaka, Kawaue, Akira, Seshimo, Takehiro, Hada, Hideo, Nakamura, Tsuyoshi, Yoshii, Yasuhiro, Onodera, Junichi, Ogawa, Satoshi
Published in Journal of Photopolymer Science and Technology (01.01.2008)
Published in Journal of Photopolymer Science and Technology (01.01.2008)
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