RAPID AND PRECISE TEMPERATURE CONTROL FOR THERMAL ETCHING
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Year of Publication 07.10.2021
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Year of Publication 07.10.2021
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IN SITU DECLOGGING IN PLASMA ETCHING
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Year of Publication 27.04.2023
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Year of Publication 27.04.2023
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Plasma apparatus for high aspect ratio selective lateral etch using cyclic passivation and etching
Park, Pilyeon, Chang, Hsiao-Wei, Kawaguchi, Mark Naoshi, Park, Seung-Ho, Eason, Kwame
Year of Publication 18.05.2021
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Year of Publication 18.05.2021
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Film stack simplification for high aspect ratio patterning and vertical scaling
Yang, Jialing, Chi, Hao, van Schravendijk, Bart J, Kawaguchi, Mark Naoshi, Musselwhite, Nathan, Uglow, Jay E, Altieri, Nicholas Dominic, Shankar, Nagraj, Shen, Meihua, Banerji, Ananda K, Kamarthy, Gowri Channa, Wu, Hui-Jung, Lill, Thorsten Bernd, Hoang, John, Routzahn, Aaron Lynn, Gunawan, Gereng, McLaughlin, Kevin M
Year of Publication 03.09.2024
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Year of Publication 03.09.2024
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Selective precision etching of semiconductor materials
GORDON, MADELEINE PARKER, MUSSELWHITE, NATHAN, KAWAGUCHI, MARK NAOSHI
Year of Publication 01.12.2023
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Year of Publication 01.12.2023
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HIGH ASPECT RATIO SELECTIVE LATERAL ETCH USING CYCLIC PASSIVATION AND ETCHING
KAWAGUCHI, Mark Naoshi, EASON, Kwame, CHANG, Hsiao-Wei, PARK, Pilyeon, PARK, Seung-Ho
Year of Publication 27.02.2020
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Year of Publication 27.02.2020
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Dual sensor wafer temperature measurement system
KALINOVSKI, ILIA, HUANG, ZHILIN, BERNEY, BUTCH, MUI, DAVID S. L, KAWAGUCHI, MARK NAOSHI
Year of Publication 01.06.2024
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Year of Publication 01.06.2024
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HIGH ASPECT RATIO SELECTIVE LATERAL ETCH USING CYCLIC PASSIVATION AND ETCHING
Park, Pilyeon, Chang, Hsiao-Wei, Kawaguchi, Mark Naoshi, Park, Seung-Ho, Eason, Kwame
Year of Publication 04.07.2019
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Year of Publication 04.07.2019
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High aspect ratio selective lateral etch using cyclic passivation and etching
Park, Pilyeon, Chang, Hsiao-Wei, Kawaguchi, Mark Naoshi, Park, Seung-Ho, Eason, Kwame
Year of Publication 30.04.2019
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Year of Publication 30.04.2019
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Selective oxide etch using liquid precursor
ZHU, JI, PARK, SEUNG-HO, GUILLAUSSIER, ADRIEN CAMILLE, KAWAGUCHI, MARK NAOSHI
Year of Publication 01.02.2024
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Year of Publication 01.02.2024
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HIGH ASPECT RATIO SELECTIVE LATERAL ETCH USING CYCLIC PASSIVATION AND ETCHING
KAWAGUCHI, Mark Naoshi, EASON, Kwame, CHANG, Hsiao-Wei, PARK, Pilyeon, PARK, Seung-Ho
Year of Publication 07.02.2019
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Year of Publication 07.02.2019
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HIGH ASPECT RATIO SELECTIVE LATERAL ETCH USING CYCLIC PASSIVATION AND ETCHING
Park, Pilyeon, Chang, Hsiao-Wei, Kawaguchi, Mark Naoshi, Park, Seung-Ho, Eason, Kwame
Year of Publication 07.02.2019
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Year of Publication 07.02.2019
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Selective SIGE etching using thermal F2 with additive
ZHU, JI, GORDON, MADELEINE PARKER, MELAET, GEROME MICHEL DOMINIQUE, HUA, XUE-FENG, KAWAGUCHI, MARK NAOSHI
Year of Publication 16.06.2024
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Year of Publication 16.06.2024
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Liquid-cooled optical window for semiconductor processing chamber
KALINOVSKI, ILIA, BERNEY, BUTCH, MUI, DAVID S. L, GAO, SONGQI, CORD, BRYAN MICHAEL, KAWAGUCHI, MARK NAOSHI, CHOKSHI, HIMANSHU
Year of Publication 16.02.2024
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Year of Publication 16.02.2024
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FILM STACK SIMPLIFICATION FOR HIGH ASPECT RATIO PATTERNING AND VERTICAL SCALING
Yang, Jialing, Chi, Hao, van Schravendijk, Bart J, Kawaguchi, Mark Naoshi, Musselwhite, Nathan, Uglow, Jay E, Altieri, Nicholas Dominic, Shankar, Nagraj, Shen, Meihua, Banerji, Ananda K, Kamarthy, Gowri Channa, Wu, Hui-Jung, Lill, Thorsten Bernd, Hoang, John, Routzahn, Aaron Lynn, Gunawan, Gereng, McLaughlin, Kevin M
Year of Publication 17.02.2022
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Year of Publication 17.02.2022
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Fast and accurate temperature control for thermal etching
BERNEY, BUCCI, KAWAGUCHI MARK NAOSHI, LAFDOVSKY NATHAN, SI HONGBO, ZHU JI
Year of Publication 03.02.2023
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Year of Publication 03.02.2023
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