Tungsten Contact and Line Resistance Reduction with Advanced Pulsed Nucleation Layer and Low Resistivity Tungsten Treatment
Chandrashekar, Anand, Chen, Feng, Lin, Jasmine, Humayun, Raashina, Wongsenakhum, Panya, Chang, Sean, Danek, Michal, Itou, Takamasa, Nakayama, Tomoo, Kariya, Atsushi, Kawaguchi, Masazumi, Hizume, Shunichi
Published in Japanese Journal of Applied Physics (01.09.2010)
Published in Japanese Journal of Applied Physics (01.09.2010)
Get full text
Journal Article
PHOTOELECTRON COMPOSITE SEMICONDUCTOR ELEMENT
NINOMIYA TAKAO, KAWAGUCHI MASAZUMI, SHIOJIMA KENJI, NOMURA TAKEHIKO, SHIINA TAIICHI, IKEDA MASAKIYO, NAKAI AKINOBU
Year of Publication 04.08.1995
Get full text
Year of Publication 04.08.1995
Patent