Ultra large pitch and depth structures metrology using spectral reflectometry in combination with RCWA based model and TLM Algorithm : AM: Advanced Metrology
Vito, Annalisa Del, Osherov, Ilya, Urbanowicz, Adam Michal, Katz, Yinon, Barkan, Kobi, Turovets, Igor, Haupt, Ronny
Published in 2020 31st Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC) (01.08.2020)
Published in 2020 31st Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC) (01.08.2020)
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Conference Proceeding
Practical aspects of TMU based analysis for scatterometry model referencing AM: Advanced metrology
Hartig, Carsten, Urbanowicz, Adam M., Vaid, Alok, Ebersbach, Peter, Fischer, Daniel, Melzer, Robert, Sanchez, Francisco, Mezerette, David, Katz, Yinon, Sendelbach, Matthew
Published in 2017 28th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC) (01.05.2017)
Published in 2017 28th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC) (01.05.2017)
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Conference Proceeding