Application of a new adhesion promoter to stable chemically amplified resist pattern fabrication on boron phosphorus silicate glass substrates
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Conference Proceeding
Journal Article
Design Concepts of Single-Layer Resists for Vacuum Ultraviolet Lithography
Kishimura, Shinji, Katsuyama, Akiko, Sasago, Masaru, Shirai, Masamitsu, Tsunooka, Masahiro
Published in Japanese Journal of Applied Physics (01.12.1999)
Published in Japanese Journal of Applied Physics (01.12.1999)
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Journal Article
Advanced thermal improvement method for chemically amplified resists
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Conference Proceeding
Journal Article
A Strategic Optical Lithography for Below 0.25 Micron Design Rules
YAMASHITA, Kazuhiro, ENDO, Masayuki, KOIZUMI, Taichi, MATSUO, Takahiro, MATSUOKA, Kouji, KATSUYAMA, Akiko, KOBAYASHI, Satoshi, NOMURA, Noboru
Published in Journal of photopolymer science and technology (1993)
Published in Journal of photopolymer science and technology (1993)
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Journal Article
FINE PATTERN FORMING MATERIAL AND PATTERN FORMATION PROCESS
HASHIMOTO, KAZUHIKO, NIGISHI, TAKAAKI, KATSUYAMA, AKIKO, URANO, FUMIYOSHI, ENDO, MASAYUKI
Year of Publication 15.06.2000
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Year of Publication 15.06.2000
Patent