Characterization of Charged Traps near Si–SiO 2 Interface in Photo-Induced Chemical Vapor Deposited SiO 2 Film
Hideaki Yamamoto, Hideaki Yamamoto, Shinya Iwasaki, Shinya Iwasaki, Katsuhide Okumura, Katsuhide Okumura, Takeshi Kanashima, Takeshi Kanashima, Masanori Okuyama, Masanori Okuyama, Yoshihiro Hamakawa, Yoshihiro Hamakawa
Published in Japanese Journal of Applied Physics (01.02.1996)
Published in Japanese Journal of Applied Physics (01.02.1996)
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