A Fully Integrated Aluminum Dual Damascene Process Using a New Double Stopper Structure
Anand, Minakshisundaran B., Nakamura, Naofumi, Wada, Jun-ichi, Oikawa, Yasushi, Katata, Tomio, Shiba, Katsuyasu, Shibata, Hideki
Published in Japanese Journal of Applied Physics (01.10.1998)
Published in Japanese Journal of Applied Physics (01.10.1998)
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Journal Article
Highly reliable CVD-WSi metal gate electrode for nMOSFETs
Nakajima, K., Nakazawa, H., Sekine, K., Matsuo, K., Saito, T., Katata, T., Suguro, K., Tsunashima, Y.
Published in IEEE transactions on electron devices (01.10.2005)
Published in IEEE transactions on electron devices (01.10.2005)
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