In situ studies of the atomic layer deposition of thin HfO2 dielectrics by ultra high vacuum atomic force microscope
KOLANEK, Krzysztof, TALLARIDA, Massimo, KARAVAEV, Konstantin, SCHMEISSER, Dieter
Published in Thin solid films (01.06.2010)
Published in Thin solid films (01.06.2010)
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Conference Proceeding
Journal Article
PrOAlN dielectrics for metal insulator semiconductor stacks
Henkel, Karsten, Torche, Mohamed, Sohal, Rakesh, Karavaev, Konstantin, Burkov, Yevgen, Schwiertz, Carola, Schmeißer, Dieter
Published in Physica status solidi. A, Applications and materials science (01.02.2011)
Published in Physica status solidi. A, Applications and materials science (01.02.2011)
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Journal Article
Atomic layer deposition reactor for fabrication of metal oxides
Kolanek, Krzysztof, Tallarida, Massimo, Michling, Marcel, Karavaev, Konstantin, Schmeisser, Dieter
Published in Physica status solidi. C (01.04.2011)
Published in Physica status solidi. C (01.04.2011)
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Journal Article
Novel "In-situ 2 " Approach to Modified ALD Processes for Nano-functional Metal Oxide Films
Tallarida, Massimo, Karavaev, Konstantin, Schmeisser, Dieter
Published in ECS transactions (25.09.2009)
Published in ECS transactions (25.09.2009)
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Journal Article
Pr―O―Al―N dielectrics for metal insulator semiconductor stacks : Integrated Electroceramic Functional Structures
HENKEL, Karsten, TORCHE, Mohamed, SOHAL, Rakesh, KARAVAEV, Konstantin, BURKOV, Yevgen, SCHWIERTZ, Carola, SCHMEISSER, Dieter
Published in Physica status solidi. A, Applications and materials science (2011)
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Published in Physica status solidi. A, Applications and materials science (2011)
Journal Article
In-Situ Studies of ALD Growth of Hafnium Oxide Films
Karavaev, Konstantin, Kolanek, Krzysztof, Tallarida, Massimo, Schmeißer, Dieter, Zschech, Ehrenfried
Published in Advanced engineering materials (01.04.2009)
Published in Advanced engineering materials (01.04.2009)
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Journal Article