Tools for modeling radioactive contaminants in chip materials
Wrobel, F, Kaouache, A, Saigné, F, Touboul, A D, Schrimpf, R D, Warot, G, Bruguier, O
Published in Semiconductor science and technology (01.03.2017)
Published in Semiconductor science and technology (01.03.2017)
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Journal Article
Analytical Method to Evaluate Soft Error Rate Due to Alpha Contamination
Kaouache, A., Wrobel, F., Saigne, F., Touboul, A. D., Schrimpf, R. D.
Published in IEEE transactions on nuclear science (01.12.2013)
Published in IEEE transactions on nuclear science (01.12.2013)
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Journal Article