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Published in IEEE transactions on semiconductor manufacturing (01.02.2007)
Published in IEEE transactions on semiconductor manufacturing (01.02.2007)
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Hot-Wall Chemical-Vapor-Deposition of Amorphous-Silicon and Its Application to Thin-Film Transistors
Ahn, Byung-Chul, Shimizu, Kazuhiro, Satoh, Tsutomu, Kanoh, Hiroshi, Osamu Sugiura, Osamu Sugiura, Masakiyo Matsumura, Masakiyo Matsumura
Published in Japanese Journal of Applied Physics (01.12.1991)
Published in Japanese Journal of Applied Physics (01.12.1991)
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UCHIDA, Y, KANOH, H, SUGIURA, O, MATSUMURA, M
Published in Japanese Journal of Applied Physics (01.12.1990)
Published in Japanese Journal of Applied Physics (01.12.1990)
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Low-temperature chemical vapor deposition of silicon nitride using a new source gas (hydrogen azide)
ISHIHARA, R, KANOH, H, SUGIURA, O, MATSUMURA, M
Published in Japanese Journal of Applied Physics (01.02.1992)
Published in Japanese Journal of Applied Physics (01.02.1992)
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Amorphous-silicon thin-film transistors using chemical vapor deposition of disilane
BREDDELS, P. A, KANOH, H, SUGIURA, O, MATSUMURA, M
Published in Japanese Journal of Applied Physics (01.10.1990)
Published in Japanese Journal of Applied Physics (01.10.1990)
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Characterization of chemical-vapor-deposited amorphous-silicon films
SHIRAIWA, T, SUGIURA, O, KANOH, H, ASAI, N, USAMI, K.-I, HATTORI, T, MATSUMURA, M
Published in Japanese Journal of Applied Physics (1993)
Published in Japanese Journal of Applied Physics (1993)
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Journal Article
Chemical Vapour Deposition of Amorphous Silicon with Silanes for Thin Film Transistors –The Influence of the Amorphous Silicon Deposition Temperature
Breddels, Paul A., Kanoh, Hiroshi, Osamu Sugiura, Osamu Sugiura, Masakiyo Matsumura, Masakiyo Matsumura
Published in Japanese Journal of Applied Physics (01.02.1991)
Published in Japanese Journal of Applied Physics (01.02.1991)
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Top-gate amorphous-silicon thin-film transistors produced by CVD method
KANOH, H, YASUKAWA, M, SUGIURA, O, BREDDELS, P. A, MATSUMURA, M
Published in Japanese Journal of Applied Physics (01.12.1990)
Published in Japanese Journal of Applied Physics (01.12.1990)
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Normal-pressure and low-temperature thermal oxidation of silicon
ZHANG, H, KANOH, H, SUGIURA, O, ODA, S, UCHIDA, Y, HATTORI, T, MATSUMURA, M
Published in Japanese Journal of Applied Physics (01.11.1987)
Published in Japanese Journal of Applied Physics (01.11.1987)
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Journal Article
REFLECTION TYPE LIQUID CRYSTAL DISPLAY DEVICE AND METHOD OF FABRICATING THE SAME
KANOH HIROSHI, SUZUKI TERUAKI, IKENO HIDENORI, KIKKAWA HIRONORI, YAMAGUCHI YUICHI
Year of Publication 16.05.2002
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Year of Publication 16.05.2002
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