Anordnung zur Kontaminationsreduzierung in einem optischen System, insbesondere in einer mikrolithographischen Projektionsbelichtungsanlage
van den Heuvel, Leonie, Sosniak, Lukasz, Anantharaman, Vinod, Schaareman, Paul, Wernaart, Twan, Schoenmakers, Peter, Koller, Paul, Kaller, Julian
Year of Publication 19.04.2018
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Year of Publication 19.04.2018
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OPTICAL ELEMENT UNIT FOR EXPOSURE PROCESS
GELLRICH BERNHARD, SCHLETTERER THOMAS, KUGLER JENS, SCHERLE HANS-JUERGEN, MUELLER DETLEV, SCHMERECK DIETER, KALLER JULIAN, LIMBACH GUIDO
Year of Publication 08.09.2011
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Year of Publication 08.09.2011
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MICROLITHOGRAPHY PROJECTION OBJECTIVE
PERRIN, JEAN-CLAUDE, KRAEHMER, DANIEL, OKON, THOMAS, GRUNER, TORALF, FELDMANN, HEIKO, EPPLE, ALEXANDER, KAMENOV, VLADIMIR, KALLER, JULIAN, DODOC, AURELIAN, CONRADI, OLAF
Year of Publication 03.10.2012
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Year of Publication 03.10.2012
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MICROLITHOGRAPHY PROJECTION OBJECTIVE
AURELIAN DOTOK, TORALF GRUNER, VLADIMIR KAMENOV, PERRIN JEAN-CLAUDE, ALEXANDER EPPLE, THOMAS OKON, OLAF CONRADI, FELDMANN HEIKO, DANIEL KRAEHMER, JULIAN KALLER
Year of Publication 27.09.2012
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Year of Publication 27.09.2012
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MICROLITHOGRAPHY PROJECTION OBJECTIVE
FELDMANN, HEIKO, EPPLE, ALEXANDER, KAMENOV, VLADIMIR, KALLER, JULIAN, DODOC, AURELIAN
Year of Publication 07.12.2006
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Year of Publication 07.12.2006
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CLEANING MODULE AND EUV LITHOGRAPHY DEVICE WITH CLEANING MODULE
EHM DIRK HEINRICH, KRAUS DIETER, WIESNER STEFAN, KOEHLER STEFAN, KALLER JULIAN, SCHMIDT STEFAN, CZAP ALMUT, CHUNG HIN-YIU ANTHONY
Year of Publication 10.03.2011
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Year of Publication 10.03.2011
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Cleaning module useful for cleaning components of extreme ultra violet lithography device e.g. mirror comprises supply for cleaning gas and device for exciting cleaning gas containing cold cathode, plasma generating unit, and hot cathode
WIESNER, STEFAN, KOEHLER, STEFAN, CHUNG, HIN YIU ANTHONY, SCHMIDT, STEFAN, CZAP, ALMUT, EHM, DIRK HEINRICH, KALLER, JULIAN, KRAUS, DIETER
Year of Publication 28.01.2010
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Year of Publication 28.01.2010
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Lens Module Comprising at Least One Exchangeable Optical Element
BUECHELE JOACHIM, BACK STEPHAN, SOYEZ GUIDO, KALLER JULIAN, LIMBACH GUIDO, WOELFLE HARALD
Year of Publication 12.06.2008
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Year of Publication 12.06.2008
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OPTICAL ELEMENT UNIT FOR EXPOSURE PROCESSES
MUELLER, DETLEV, GELLRICH, BERNHARD, SCHLETTERER, THOMAS, SCHERLE, HANS, JUERGEN, SCHMEREK, DIETER, KUGLER, JENS, LIMBACH, GUIDO, KALLER, JULIAN
Year of Publication 11.11.2009
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Year of Publication 11.11.2009
Patent
CLEANING MODULE AND EUV LITHOGRAPHY DEVICE WITH CLEANING MODULE
WIESNER, STEFAN, KOEHLER, STEFAN, SCHMIDT, STEFAN, EHM, DIRK, HEINRICH, CZAP, ALMUT, KALLER, JULIAN, KRAUS, DIETER, CHUNG, HIN-YIU, ANTHONY
Year of Publication 08.10.2009
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Year of Publication 08.10.2009
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Optical system i.e. projection lens, for use in microlithography, has housing including two individual housing parts provided with optical unit, where flushing gas e.g. neon, flows via inlet opening into housing
BUEHLER, CORNELIA, BACK, STEPHAN, PETASCH, THOMAS, RAU, JOHANNES, KOHL, ALEXANDER, KALLER, JULIAN
Year of Publication 07.02.2008
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Year of Publication 07.02.2008
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Optical element unit for exposure processes
Gellrich, Bernhard, Kugler, Jens, Schletterer, Thomas, Limbach, Guido, Kaller, Julian, Scherle, Hans-Juergen, Mueller, Detlev, Schmerek, Dieter
Year of Publication 09.06.2009
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Year of Publication 09.06.2009
Patent
Optical element unit for exposure processes
GELLRICH BERNHARD, SCHLETTERER THOMAS, KUGLER JENS, SCHERLE HANS-JUERGEN, MUELLER DETLEV, KALLER JULIAN, LIMBACH GUIDO, SCHMEREK DIETER
Year of Publication 09.06.2009
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Year of Publication 09.06.2009
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LENS MODULE COMPRISING AT LEAST ONE REPLACEABLE OPTICAL ELEMENT
BUECHELE JOACHIM, BACK STEPHAN, SOYEZ GUIDO, KALLER JULIAN, LIMBACH GUIDO, WOELFLE HARALD
Year of Publication 28.08.2007
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Year of Publication 28.08.2007
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