Search Results - "Kaller Julian" :: K.UTB vyhledávací portál

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Vorrichtung und Verfahren zur Vermeidung einer Degradation einer optischen Nutzoberfläche eines Spiegelmoduls, Projektionssystem, Beleuchtungssystem sowie Projektionsbelichtungsanlage

by Becker, Moritz, Storm, Arnoldus Jan, Kaller, Julian
Year of Publication 15.06.2023

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OPTICAL ASSEMBLY HAVING A THERMALLY CONDUCTIVE COMPONENT

by Sorg, Franz, Winter, Ralf, Weissenrieder, Karl-Stefan, Kaller, Julian
Year of Publication 02.04.2020

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Optical assembly having a thermally conductive component

by Sorg, Franz, Winter, Ralf, Weissenrieder, Karl-Stefan, Kaller, Julian
Year of Publication 17.12.2019

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Projektionsbelichtungsanlage für die Halbleiterlithografie

by Taufall, Kai, Marzok, Carsten, Kaller, Julian
Year of Publication 19.01.2023

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Komponenten mit Wasserstoffschutzbeschichtung für EUV-Projektionsbelichtungsanlagen und Verfahren zur Herstellung derselben

by KALLER, JULIAN
Year of Publication 01.10.2015

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Apparatus for scattered light inspection of optical elements

by Kaller, Julian
Year of Publication 28.10.2008

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Apparatus for scattered light inspection of optical elements

by KALLER JULIAN
Year of Publication 28.10.2008

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Projection exposure method and projection exposure system therefor

by Kaller, Julian, Gruner, Toralf
Year of Publication 21.08.2012

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Projection exposure method and projection exposure system therefor

by GRUNER TORALF, KALLER JULIAN
Year of Publication 21.08.2012

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Optical arrangement used in microlithography comprises photomask and adsorbing substance arranged in intermediate chamber to bind contaminating gases containing hydrocarbons by physical adsorption and/or chemical adsorption

by KALLER, JULIAN
Year of Publication 05.07.2007

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Messvorrichtung und Verfahren zum Vermessen einer Oberflächenform eines optischen Elements

by Löring, Ulrich, Stiepan, Hans Michael, Monz, Thomas, Kaller, Julian
Year of Publication 01.12.2022

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Zuführen von gasförmigem Wasserstoff in eine Vakuum-Kammer einer optischen oder elektronen-optischen Anordnung

by Wagner, Kai, Kaller, Julian
Year of Publication 28.09.2017

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OPTICAL ASSEMBLY HAVING A THERMALLY CONDUCTIVE COMPONENT

by Sorg Franz, Winter Ralf, Weissenrieder Karl-Stefan, Kaller Julian
Year of Publication 14.09.2017

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Substrates for mirrors for EUV lithography and their production

by CLAUSS WILFRIED, KALLER JULIAN, GERHARD MICHAEL
Year of Publication 03.06.2015

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PRODUCTION METHOD AND MEASUREMENT METHOD

by KALLER, Julian, MONZ, Thomas, LÖRING, Ulrich, STIEPAN, Hans Michael
Year of Publication 14.04.2022

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OPTICAL ASSEMBLY, IN PARTICULAR IN A PROJECTION EXPOSURE SYSTEM FOR EUV LITHOGRAPHY

by Ehm, Dirk Heinrich, Kaller, Julian
Year of Publication 25.07.2018

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Apparatus for scattered light inspection of optical elements

by KALLER JULIAN
Year of Publication 03.03.2005

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Storage device e.g. wafer stage for mounting substrate e.g. wafer in microlithography projection exposure system, has coupling unit arranged such that fixing unit is coupled by magnetic forces to supporting unit

by KALLER, JULIAN
Year of Publication 20.12.2012

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Scattered light inspection of the objective surface of the field-closest lens of a projection objective of a microlithography projection illumination system by use of an optical inspection unit mounted in the reticule holder

by KALLER, JULIAN
Year of Publication 27.01.2005

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Substrates for mirrors for EUV lithography and their production

by CLAUSS WILFRIED, KALLER JULIAN, GERHARD MICHAEL
Year of Publication 28.10.2014

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