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Influence of local feature of electron cyclotron resonance plasma on the formation of amorphous hydrogenated silicon films
by
WEI CHEN
,
MIYAKE, S
,
ARIYASU, T
,
KYOU
,
B
Published in
Japanese Journal of Applied Physics
(1995)
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Journal Article
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engineering
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physics
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a-si:h film
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chemical vapor deposition
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condensed matter: electronic structure, electrical, magnetic, and optical properties
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cross-disciplinary physics: materials science; rheology
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ecr plasma
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electronic transport phenomena in thin films and low-dimensional structures
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English
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IOP_英国物理学会现刊(含NSTL购买的14种刊)
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