Selective Removal of Dry-Etching Residue Derived from Polymer Sacrificial Layer for Microelectromechanical-System Device Fabrication
Takagahara, Kazuhiko, Kuwabara, Kei, Sakata, Tomomi, Ishii, Hiromu, Sato, Yasuhiro, Jin, Yoshito
Published in Japanese Journal of Applied Physics (01.09.2012)
Published in Japanese Journal of Applied Physics (01.09.2012)
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Journal Article
Selective Removal of Dry-Etching Residue Derived from Polymer Sacrificial Layer for Microelectromechanical-System Device Fabrication
Takagahara, Kazuhiko, Kuwabara, Kei, Sakata, Tomomi, Ishii, Hiromu, Sato, Yasuhiro, Jin, Yoshito
Published in Japanese Journal of Applied Physics (01.09.2012)
Published in Japanese Journal of Applied Physics (01.09.2012)
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Journal Article
Surface Cleaning of Gold Structure by Annealing during Fabrication of Microelectromechanical System Devices
Sakata, Tomomi, Okabe, Yuichi, Kuwabara, Kei, Sato, Norio, Ono, Kazuyoshi, Shimoyama, Nobuhiro, Machida, Katsuyuki, Ishii, Hiromu
Published in Japanese Journal of Applied Physics (01.02.2009)
Published in Japanese Journal of Applied Physics (01.02.2009)
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Journal Article
Monolithic Integration Fabrication Process of Thermoelectric and Vibrational Devices for Microelectromechanical System Power Generator
Sato, Norio, Kuwabara, Kei, Ono, Kazuyoshi, Sakata, Tomomi, Morimura, Hiroki, Terada, Jun, Kudou, Kazuhisa, Kamei, Toshikazu, Yano, Masaki, Machida, Katsuyuki, Ishii, Hiromu
Published in Japanese Journal of Applied Physics (01.09.2007)
Published in Japanese Journal of Applied Physics (01.09.2007)
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Journal Article
Novel Structure and Fabrication Process for Integrated RF Microelectromechanical-System Technology
Kuwabara, Kei, Urano, Masami, Kodate, Junichi, Sato, Norio, Morimura, Hiroki, Sakata, Tomomi, Ishii, Hiromu, Kamei, Toshikazu, Kudou, Kazuhisa, Yano, Masaki, Machida, Katsuyuki
Published in Japanese Journal of Applied Physics (01.09.2006)
Published in Japanese Journal of Applied Physics (01.09.2006)
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Journal Article
Removal of Gold Oxide by Low-Temperature Hydrogen Annealing for Microelectromechanical System Device Fabrication
Sakata, Tomomi, Ishii, Hiromu, Nagase, Masao, Takagahara, Kazuhiko, Kuwabara, Kei, Ono, Kazuyoshi, Sato, Norio, Machida, Katsuyuki
Published in Japanese Journal of Applied Physics (01.06.2012)
Published in Japanese Journal of Applied Physics (01.06.2012)
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Journal Article
Electrodeposition of Water-Repellent Organic Dielectric Film as an Anti-Sticking Coating on Microelectromechanical System Devices
Sakata, Tomomi, Kuwabara, Kei, Shimamura, Toshishige, Sato, Norio, Nagase, Masao, Shimoyama, Nobuhiro, Kudou, Kazuhisa, Machida, Katsuyuki, Ishii, Hiromu
Published in Japanese Journal of Applied Physics (01.09.2007)
Published in Japanese Journal of Applied Physics (01.09.2007)
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Journal Article