Investigation of Co surface reaction by in situ measurement for chemical mechanical planarization and post-chemical mechanical planarization cleaning
Harada, Ken, Kusano, Tomohiro, Shibata, Toshiaki, Kawase, Yasuhiro
Published in Japanese Journal of Applied Physics (01.07.2018)
Published in Japanese Journal of Applied Physics (01.07.2018)
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Journal Article
A large intraplate earthquake triggered by latent magmatism
Umeda, Koji, Asamori, Koichi, Negi, Tateyuki, Kusano, Tomohiro
Published in Journal of Geophysical Research (01.01.2011)
Published in Journal of Geophysical Research (01.01.2011)
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Journal Article
Tectonic shortening and coeval volcanism during the Quaternary, Northeast Japan arc
Umeda, Koji, Ban, Masao, Hayashi, Shintaro, Kusano, Tomohiro
Published in Journal of Earth System Science (01.02.2013)
Published in Journal of Earth System Science (01.02.2013)
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Journal Article
Spatial variations in 3He/4He ratios along a high strain rate zone, central Japan
Umeda, Koji, Kusano, Tomohiro, Ninomiya, Atusi, Asamori, Koichi, Nakajima, Junichi
Published in Journal of Asian earth sciences (01.09.2013)
Published in Journal of Asian earth sciences (01.09.2013)
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Journal Article
CLEANING LIQUID FOR REMOVING CERIUM COMPOUND, CLEANING METHOD, AND METHOD FOR PRODUCING SEMICONDUCTOR WAFER
TAKESHITA Kan, MINAYOSHI Kanako, KUSANO Tomohiro, KIYONO Kenichi, ABE Mari
Year of Publication 19.05.2023
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Year of Publication 19.05.2023
Patent
Development of the post-chemical mechanical polishing cleaner suppressing galvanic corrosion between copper and the Co barrier metal
Kusano, Tomohiro, Shibata, Toshiaki, Itou, Atsushi, Mizutani, Fumikazu
Published in Proceedings of International Conference on Planarization/CMP Technology 2014 (01.11.2014)
Published in Proceedings of International Conference on Planarization/CMP Technology 2014 (01.11.2014)
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Conference Proceeding
세륨 화합물 제거용 세정액, 세정 방법 및 반도체 웨이퍼의 제조 방법
KIYONO KENICHI, ONO YUKAKO, TAKESHITA KAN, AN LONGJIE, KUSANO TOMOHIRO
Year of Publication 08.08.2022
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Year of Publication 08.08.2022
Patent
Si1-XGeX Selective Etchant for Gate-All-Around Transistors
Harada, Ken, Holsteyns, Frank, Oniki, Yusuke, Kusano, Tomohiro, Struyf, Herbert, Takeshita, Kan, Altamirano-Sanchez, Efrain, Suzuki, Tatsunobu
Published in Solid state phenomena (01.02.2021)
Published in Solid state phenomena (01.02.2021)
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Journal Article
CLEANING LIQUID FOR REMOVING CERIUM COMPOUNDS, CLEANING METHOD, AND METHOD FOR PRODUCING SEMICONDUCTOR WAFER
TAKESHITA Kan, KUSANO Tomohiro, ONO Yukako, KIYONO Kenichi, AN Longjie
Year of Publication 10.06.2021
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Year of Publication 10.06.2021
Patent
세정액, 세정 방법 및 반도체 웨이퍼의 제조 방법
SHIBATA TOSHIAKI, HARADA KEN, KAWASE YASUHIRO, ITO ATSUSHI, KUSANO TOMOHIRO, TAKESHITA YUTARO
Year of Publication 10.05.2021
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Year of Publication 10.05.2021
Patent