Estimation of ion incident angle from Si etching profiles
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Conference Proceeding
Journal Article
Analysis of Polymer Formation during SiO 2 Microwave Plasma Etching
Gotoh, Yasushi, Tokuo Kure, Tokuo Kure
Published in Japanese Journal of Applied Physics (01.04.1995)
Published in Japanese Journal of Applied Physics (01.04.1995)
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Journal Article
Highly Selective Etching of Poly-Si by Time Modulation Bias
Ono, Tetsuo, Miyazaki, Hiroshi, Mizutani, Tatsumi, Goto, Yasushi, Kure, Tokuo
Published in Japanese Journal of Applied Physics (01.09.1999)
Published in Japanese Journal of Applied Physics (01.09.1999)
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Journal Article
Highly Anisotropic Etching of Polysilicon by Time-Modulation Bias
Ono, Tetsuo, Mizutani, Tatsumi, Goto, Yasushi, Kure, Tokuo
Published in Japanese Journal of Applied Physics (01.08.2000)
Published in Japanese Journal of Applied Physics (01.08.2000)
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Journal Article
Analysis of polymer formation during SiO2 microwave plasma etching
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Conference Proceeding
Tungsten gate technology for quarter-micron application
NODA, H, SAKIYAMA, H, GOTO, Y, KURE, T, KIMURA, S
Published in Japanese Journal of Applied Physics (1996)
Published in Japanese Journal of Applied Physics (1996)
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Conference Proceeding
Journal Article
Nucleation and crystallization characteristics of phosphorus-doped amorphous silicon slit nano wire
WADA, Y, KOBAYASHI, T, KURE, T, YOSHIMURA, T, SUDOU, Y, GOTOU, Y, KONDO, S
Published in Journal of the Electrochemical Society (01.05.1994)
Published in Journal of the Electrochemical Society (01.05.1994)
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Journal Article
Low-temperature etching for deep-submicron trilayer resist
KURE, T, KAWAKAMI, H, TACHI, S, ENAMI, H
Published in Japanese Journal of Applied Physics (01.07.1991)
Published in Japanese Journal of Applied Physics (01.07.1991)
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Journal Article
CLEANING METHOD FOR PIPES AND CLEANING SYSTEM FOR PIPES
ARAKI TOMOYUKI, KURE TOKUO, SUEMATSU TAKAAKI, HIGASHI EIJI, SAITO KENJI
Year of Publication 08.05.2014
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Year of Publication 08.05.2014
Patent
Single-electron memory for giga-to-tera bit storage
Yano, K., Ishii, T., Sano, T., Mine, T., Murai, F., Hashimoto, T., Kobayashi, T., Kure, T., Seki, K.
Published in Proceedings of the IEEE (01.04.1999)
Published in Proceedings of the IEEE (01.04.1999)
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Journal Article
128 Mbit single-electron memory
ISHII, Tomoyuki, YANO, Kazuo, SANO, Toshiaki, MINE, Toshiyuki, MURAI, Fumio, KURE, Tokuo, SEKI, Koichi
Published in Oyo Buturi (10.03.1999)
Published in Oyo Buturi (10.03.1999)
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Journal Article
U-Groove Isolation Technology for High Density Bipolar LSI's
Tamaki, Yoichi, Kure, Tokuo, Shiba, Takeo, Higuchi, Hisayuki
Published in Japanese Journal of Applied Physics (01.01.1982)
Published in Japanese Journal of Applied Physics (01.01.1982)
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Journal Article