Study of SF6/N2O Microwave Plasma for Surface Texturing of Multicrystalline (${<}150$ μm) Solar Substrates
Chan, Boon Teik, Kunnen, Eddy, Uhlig, Matthias, Marneffe, Jean-Francois de, Xu, Kaidong, Boullart, Werner, Rau, Bernd, Poortmans, Jef
Published in Jpn J Appl Phys (01.10.2012)
Published in Jpn J Appl Phys (01.10.2012)
Get full text
Journal Article
Demonstration of Asymmetric Gate-Oxide Thickness Four-Terminal FinFETs Having Flexible Threshold Voltage and Good Subthreshold Slope
Masahara, M., Surdeanu, R., Witters, L., Doornbos, G., Nguyen, V.H., Van den bosch, G., Vrancken, C., Devriendt, K., Neuilly, F., Kunnen, E., Jurczak, M., Biesemans, S.
Published in IEEE electron device letters (01.03.2007)
Published in IEEE electron device letters (01.03.2007)
Get full text
Journal Article
(Invited) Gate-All-Around Transistors Based on Vertically Stacked Si Nanowires
Mertens, Hans, Ritzenthaler, Romain, Hikavyy, Andriy Yakovitch, Kim, Min-Soo, Tao, Zheng, Wostyn, Kurt, Schram, Tom, Kunnen, Eddy, Ragnarsson, Lars-Åke, Dekkers, Harold F. W., Hopf, Toby, Devriendt, Katia, Tsvetanova, Diana, Chew, Soon Aik, Kikuchi, Yoshiaki, Van Besien, Els, Rosseel, Erik, Mannaert, Geert, De Keersgieter, An, Chasin, Adrian, Kubicek, Stefan, Dangol, Anish, Demuynck, Steven, Barla, Kathy, Mocuta, Dan, Horiguchi, Naoto
Published in ECS transactions (26.04.2017)
Published in ECS transactions (26.04.2017)
Get full text
Journal Article
Study of SF 6 /N 2 O Microwave Plasma for Surface Texturing of Multicrystalline (<150 µm) Solar Substrates
Chan, Boon Teik, Kunnen, Eddy, Uhlig, Matthias, Marneffe, Jean-Francois de, Xu, Kaidong, Boullart, Werner, Rau, Bernd, Poortmans, Jef
Published in Japanese Journal of Applied Physics (01.10.2012)
Published in Japanese Journal of Applied Physics (01.10.2012)
Get full text
Journal Article
Study of SF 6 /N 2 O Microwave Plasma for Surface Texturing of Multicrystalline (<150 µm) Solar Substrates
Chan, Boon Teik, Kunnen, Eddy, Uhlig, Matthias, Marneffe, Jean-Francois de, Xu, Kaidong, Boullart, Werner, Rau, Bernd, Poortmans, Jef
Published in Japanese Journal of Applied Physics (01.10.2012)
Published in Japanese Journal of Applied Physics (01.10.2012)
Get full text
Journal Article
2D and 3D photoresist line roughness characterization
Vaglio Pret, Alessandro, Kunnen, Eddy, Gronheid, Roel, Pargon, Erwine, Luere, Olivier, Bianchi, Davide
Published in Microelectronic engineering (01.10.2013)
Published in Microelectronic engineering (01.10.2013)
Get full text
Journal Article
Development, Optimization and Evaluation of a CF 4 Pretreatment Process to Remove Unwanted Interfacial Layers in Stacks of CVD and PECVD Polycrystalline Silicon-Germanium for MEMS Applications
Bryce, George, Severi, Simone, Van Hoof, Rita, Guo, Bin, Kunnen, Eddy, Witvrouw, Ann, Decoutere, Stefaan
Published in ECS transactions (08.10.2010)
Published in ECS transactions (08.10.2010)
Get full text
Journal Article
2D and 3D photoresist line roughness characterization : Nanolithography 2012
VAGLIO PRET, Alessandro, KUNNEN, Eddy, GRONHEID, Roel, PARGON, Erwine, LUERE, Olivier, BIANCHI, Davide
Published in Microelectronic engineering (2013)
Get full text
Published in Microelectronic engineering (2013)
Conference Proceeding
Reactive Ion Etch of Si3N4 Spacers High Selective to Germanium
Altamirano, Efrain, Kunnen, Eddy, De Jaeger, Brice, Boullart, Werner
Published in ECS transactions (03.10.2008)
Published in ECS transactions (03.10.2008)
Get full text
Journal Article
The etchback approach: Enlarged process window for MuGFET gate etching
Degroote, Bart, Collaert, Nadine, Rooyackers, Rita, Baklanov, Mikhail R., Boullart, Werner, Kunnen, Eddy, Jurczak, Malgorzata, Vanhaelemeersch, Serge
Published in Microelectronic engineering (01.03.2006)
Published in Microelectronic engineering (01.03.2006)
Get full text
Journal Article