Optical emission during the plasma etch for process control of the litho-etch bias
Altamirano, E., Kunnen, E., Werner, B.
Published in 2007 International Symposium on Semiconductor Manufacturing (01.10.2007)
Published in 2007 International Symposium on Semiconductor Manufacturing (01.10.2007)
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Conference Proceeding
Mass Metrology for controlling and understanding processes
Kunnen, E., Vecchio, G., Redolfi, A., Everaert, J.-L., Delabie, A., Xiaoping Shi, Vanhaelemeersch, S., Cunnane, L., Kiermansz, A.
Published in 2007 International Symposium on Semiconductor Manufacturing (01.10.2007)
Published in 2007 International Symposium on Semiconductor Manufacturing (01.10.2007)
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Conference Proceeding
(Invited) Gate-All-Around Transistors Based on Vertically Stacked Si Nanowires
Mertens, Hans, Ritzenthaler, Romain, Hikavyy, Andriy Yakovitch, Kim, Min-Soo, Tao, Zheng, Wostyn, Kurt, Schram, Tom, Kunnen, Eddy, Ragnarsson, Lars-Åke, Dekkers, Harold F. W., Hopf, Toby, Devriendt, Katia, Tsvetanova, Diana, Chew, Soon Aik, Kikuchi, Yoshiaki, Van Besien, Els, Rosseel, Erik, Mannaert, Geert, De Keersgieter, An, Chasin, Adrian, Kubicek, Stefan, Dangol, Anish, Demuynck, Steven, Barla, Kathy, Mocuta, Dan, Horiguchi, Naoto
Published in Meeting abstracts (Electrochemical Society) (15.04.2017)
Published in Meeting abstracts (Electrochemical Society) (15.04.2017)
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Journal Article