Nanoparticulate BaTiO3 film produced by aerosol-type nanoparticle deposition
Imanaka, Yoshihiko, Amada, Hideyuki, Kumasaka, Fumiaki, Awaji, Naoki, Kumamoto, Akihito
Published in Journal of nanoparticle research : an interdisciplinary forum for nanoscale science and technology (01.04.2016)
Published in Journal of nanoparticle research : an interdisciplinary forum for nanoscale science and technology (01.04.2016)
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Journal Article
An artificial photosynthesis anode electrode composed of a nanoparticulate photocatalyst film in a visible light responsive GaN-ZnO solid solution system
Imanaka, Yoshihiko, Anazawa, Toshihisa, Manabe, Toshio, Amada, Hideyuki, Ido, Sachio, Kumasaka, Fumiaki, Awaji, Naoki, Sánchez-Santolino, Gabriel, Ishikawa, Ryo, Ikuhara, Yuichi
Published in Scientific reports (19.10.2016)
Published in Scientific reports (19.10.2016)
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Journal Article
Performance of molecular resist based on polyphenol in EUV lithography
Oizumi, Hiroaki, Kumasaka, Fumiaki, Tanaka, Yuusuke, Hirayama, Taku, Shiono, Daiju, Hada, Hideo, Onodera, Junichi, Yamaguchi, Atsuko, Nishiyama, Iwao
Published in Microelectronic engineering (01.04.2006)
Published in Microelectronic engineering (01.04.2006)
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Journal Article
Conference Proceeding
Amorphous Refractory Compound Film Material for X-Ray Mask Absorbers
Iba, Yoshihisa, Kumasaka, Fumiaki, Iizuka, Takashi, Yamabe, Masaki
Published in Japanese Journal of Applied Physics (01.09.2000)
Published in Japanese Journal of Applied Physics (01.09.2000)
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Journal Article
ELECTRODE, PRODUCTION METHOD OF ELECTRODE, AND CARBON DIOXIDE FIXING DEVICE
KUMASAKA FUMIAKI, AMADA HIDEYUKI, IMANAKA YOSHIHIKO, ANAZAWA TOSHIHISA, MANABE TOSHIO
Year of Publication 20.05.2021
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Year of Publication 20.05.2021
Patent
FORMATION METHOD OF FILM AND FILM DEPOSITION APPARATUS
KUMASAKA FUMIAKI, AMADA HIDEYUKI, IMANAKA YOSHIHIKO, ANAZAWA TOSHIHISA, MANABE TOSHIO
Year of Publication 01.03.2021
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Year of Publication 01.03.2021
Patent
Pattern Etching of Ta X-ray Mask Absorber on SiC Membrane by Inductively Coupled Plasma
Iba, Yoshihisa, Kumasaka, Fumiaki, Aoyama, Hajime, Taguchi, Takao, Yamabe, Masaki
Published in Japanese Journal of Applied Physics (01.07.1998)
Published in Japanese Journal of Applied Physics (01.07.1998)
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Journal Article
Sub-100-nm Device Fabrication using Proximity X-Ray Lithography at Five Levels
Iba, Yoshihisa, Taguchi, Takao, Kumasaka, Fumiaki, Iizuka, Takashi, Sambonsugi, Yasuhiro, Aoyama, Hajime, Deguchi, Kimiyoshi, Fukuda, Makoto, Oda, Masatoshi, Morita, Hirofumi, Matsuda, Tadahito, Horiuchi, Kei, Matsui, Yasuji
Published in Japanese Journal of Applied Physics (01.12.2000)
Published in Japanese Journal of Applied Physics (01.12.2000)
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Journal Article
Precise stress control of Ta absorber using low stress alumina etching mask for X-ray mask fabrication
IBA, Y, KUMASAKA, F, AOYAMA, H, TAGUCHI, T, YAMABE, M
Published in Japanese Journal of Applied Physics (01.12.1996)
Published in Japanese Journal of Applied Physics (01.12.1996)
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Conference Proceeding
Journal Article
Etching Residues of Sputtered Ta Film Using Chlorine-Based Plasma
Iba, Yoshihisa, Kumasaka, Fumiaki, Takeda, Masayuki, Aoyama, Hajime, Yamabe, Masaki
Published in Japanese Journal of Applied Physics (15.02.1998)
Published in Japanese Journal of Applied Physics (15.02.1998)
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Journal Article
Microstructure and Dielectric Properties of Composite Films for Embedded Capacitor Applications: Dielectric Composite Using Aerosol Deposition
Imanaka, Yoshihiko, Amada, Hideyuki, Kumasaka, Fumiaki
Published in International journal of applied ceramic technology (01.05.2011)
Published in International journal of applied ceramic technology (01.05.2011)
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Journal Article