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Recent progress on photoreactions in microreactors

Recent progress on photoreactions in microreactors

by Matsushita, Yoshihisa, Ichimura, Teijiro, Ohba, Nobuko, Kumada, Shinji, Sakeda, Kosaku, Suzuki, Tadashi, Tanibata, Hideki, Murata, Toshiaki
Published in Pure and applied chemistry (01.11.2007)

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Journal Article

Photocatalytic reduction in microreactors

Photocatalytic reduction in microreactors

by Matsushita, Yoshihisa, Kumada, Shinji, Wakabayashi, Kazuhito, Sakeda, Kosaku, Ichimura, Teijiro
Published in Chemistry letters (01.04.2006)

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Journal Article

Photocatalytic N-alkylation of benzylamine in microreactors

Photocatalytic N-alkylation of benzylamine in microreactors

by Matsushita, Yoshihisa, Ohba, Nobuko, Kumada, Shinji, Suzuki, Tadashi, Ichimura, Teijiro
Published in Catalysis communications (01.12.2007)

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Journal Article

AQUEOUS CLEANING LIQUID

AQUEOUS CLEANING LIQUID

by KIMURA KENTA, KUMADA SHINJI, KONDO JUN, SUGA EITA, NAMIKI TAKUMI
Year of Publication 21.08.2024

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Patent

Photocatalytic reactions in microreactors

Photocatalytic reactions in microreactors

by Matsushita, Yoshihisa, Ohba, Nobuko, Kumada, Shinji, Sakeda, Kosaku, Suzuki, Tadashi, Ichimura, Teijiro
Published in Chemical engineering journal (1996) (15.01.2008)

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Journal Article Conference Proceeding

SURFACE TREATMENT LIQUID, SURFACE TREATMENT METHOD, AND METHOD FOR SUPPRESSING PATTERN COLLAPSE

SURFACE TREATMENT LIQUID, SURFACE TREATMENT METHOD, AND METHOD FOR SUPPRESSING PATTERN COLLAPSE

by KUMADA SHINJI, SEKI KENJI, NAMIKI TAKUMI
Year of Publication 11.07.2019

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Patent

SURFACE TREATMENT LIQUID SURFACE TREATMENT METHOD AND METHOD FOR PREVENTING PATTERN COLLAPSE

SURFACE TREATMENT LIQUID SURFACE TREATMENT METHOD AND METHOD FOR PREVENTING PATTERN COLLAPSE

by KUMADA SHINJI, SEKI KENJI, NAMIKI TAKUMI
Year of Publication 01.07.2019

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Patent

METHOD FOR FORMING PHOTOSENSITIVE RESIN LAYER, METHOD FOR PRODUCING PHOTORESIST PATTERN, AND METHOD FOR FORMING PLATED MOLDED OBJECT

METHOD FOR FORMING PHOTOSENSITIVE RESIN LAYER, METHOD FOR PRODUCING PHOTORESIST PATTERN, AND METHOD FOR FORMING PLATED MOLDED OBJECT

by SHIMURA HIDEKAZU, KUMADA SHINJI, MOMOSAWA AYA
Year of Publication 06.10.2016

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Patent

METHOD FOR FORMING PHOTOSENSITIVE RESIN LAYER, METHOD FOR PRODUCING PHOTORESIST PATTERN, AND METHOD FOR PRODUCING PLATED MOLDED ARTICLE

METHOD FOR FORMING PHOTOSENSITIVE RESIN LAYER, METHOD FOR PRODUCING PHOTORESIST PATTERN, AND METHOD FOR PRODUCING PLATED MOLDED ARTICLE

by KUMADA SHINJI, MOMOZAWA AYA, SHIMURA EIICHI
Year of Publication 28.09.2016

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Patent

METHOD FOR FORMING COATED FILM

METHOD FOR FORMING COATED FILM

by TATE TOSHISATO, KUMADA SHINJI, KATAYAMA SHOTA, IRIE MAKIKO
Year of Publication 17.11.2014

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Patent

METHOD OF FORMING FILM

METHOD OF FORMING FILM

by TACHI TOSHIAKI, KUMADA SHINJI, KATAYAMA SHOTA, IRIE MAKIKO
Year of Publication 31.10.2014

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Patent

RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN

RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN

by KUMADA SHINJI, MAEMORI SATOSHI, ARAI MASATOSHI, SHIONO DAIJU
Year of Publication 10.09.2012

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Patent

AQUEOUS CLEANING LIQUID

AQUEOUS CLEANING LIQUID

by KUMADA, Shinji, SUGA, Eita, KONDO, Jun, NAMIKI, Takumi, KIMURA, Kenta
Year of Publication 22.08.2024

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Patent

Surface treatment liquid, surface treatment method, and method for suppressing pattern collapse

Surface treatment liquid, surface treatment method, and method for suppressing pattern collapse

by Namiki, Takumi, Seki, Kenji, Kumada, Shinji
Year of Publication 30.03.2021

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Patent

Method for forming photosensitive resin layer, method for producing photoresist pattern, and method for producing plated molded article

Method for forming photosensitive resin layer, method for producing photoresist pattern, and method for producing plated molded article

by Momozawa, Aya, Kumada, Shinji, Shimura, Eiichi
Year of Publication 16.07.2019

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Patent

SURFACE TREATMENT LIQUID, SURFACE TREATMENT METHOD, AND METHOD FOR SUPPRESSING PATTERN COLLAPSE

SURFACE TREATMENT LIQUID, SURFACE TREATMENT METHOD, AND METHOD FOR SUPPRESSING PATTERN COLLAPSE

by KUMADA, Shinji, SEKI, Kenji, NAMIKI, Takumi
Year of Publication 27.06.2019

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Patent

Resist composition, method of forming resist pattern, and compound

Resist composition, method of forming resist pattern, and compound

by KUMADA SHINJI, KOMURO YOSHITAKA
Year of Publication 20.10.2015

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Patent

Surface treatment liquid, surface treatment method, and method for suppressing pattern collapse

Surface treatment liquid, surface treatment method, and method for suppressing pattern collapse

by NAMIKI, TAKUMI, SEKI, KENJI, KUMADA, SHINJI
Year of Publication 21.01.2023

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Patent

RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, AND COMPOUND

RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, AND COMPOUND

by KUMADA SHINJI, KOMURO YOSHITAKA
Year of Publication 16.01.2014

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Patent

RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, AND COMPOUND

RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, AND COMPOUND

by KUMADA SHINJI, KOMURO YOSHITAKA
Year of Publication 05.12.2013

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Patent