Contact Hole Resist Solutions for 45-90nm Node Design Rules
Padmanaban, Murirathna, Kudo, Takamori, Lin, Guanyang, Hong, Sungeun, Nishibe, Takeshi, Takano, Yusuke
Published in Journal of Photopolymer Science and Technology (01.01.2004)
Published in Journal of Photopolymer Science and Technology (01.01.2004)
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Journal Article
Polymer Optimization of Pigmented Photoresists for Color Filter Production
Kudo, Takanori, Nanjo, Yuki, Nozaki, Yuko, Yamaguchi, Hidemasa, Kang, Wen-Bing, Pawlowski, Georg
Published in Japanese Journal of Applied Physics (01.03.1998)
Published in Japanese Journal of Applied Physics (01.03.1998)
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Journal Article
기판 위에 편석층을 제조하는 방법, 및 소자를 제조하는 방법
DAMMEL RALPH R, OCYTKO KORNEL, HUDSON DANIEL, MORSE GRAHAM, KUDO TAKANORI, WANG CHANGSHENG, JEFFERY BEN
Year of Publication 14.11.2022
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Year of Publication 14.11.2022
Patent
Effect of Amine Additives on LWR and LER as Studied by Extraction Parameters
Houlihan, Francis M., Rentkiewicz, David, Lin, Guanyang, Rahman, Dalil, Mackenzie, Dougls, Timko, Allen, Kudo, Takanori, Anyadiegwu, Clement, Thiyqarqjan, Muthiah, Chiu, Simon, Romano, Andrew, Dammel, Rqlph R., Padmanaban, Murirathna
Published in Journal of Photopolymer Science and Technology (01.01.2006)
Published in Journal of Photopolymer Science and Technology (01.01.2006)
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Journal Article
METHOD FOR SOLDERING THICK COPPER MULTILAYER SUBSTRATE
KUDO TAKANORI, KIMURA TOSHIFUMI, NISHIGAKI KAZUHIRO, KIKUCHI YUJI, MIYAMOTO ATSUSHI
Year of Publication 30.04.2020
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Year of Publication 30.04.2020
Patent
Fabrication Process of Color Filters Using Pigmented Photoresists
Kudo, Takanori, Nanjo, Yuki, Yamaguchi, Yuko, Yamaguchi, Hidemasa, Kang, Wen-Bing, Pawlowski, Georg
Published in Japanese Journal of Applied Physics (01.06.1998)
Published in Japanese Journal of Applied Physics (01.06.1998)
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Journal Article
노볼락/DNQ 기반의 화학 증폭형 포토레지스트
CHEN HUNG YANG, YIN JIAN, KUDO TAKANORI, LIU WEIHONG, TOUKHY MEDHAT A
Year of Publication 03.02.2021
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Year of Publication 03.02.2021
Patent
Influence of ArF Resist Components and Process Conditions on the PEB Sensitivity
Padmanaban, Munirathna, Anyadiegwu, Clement, Kanda, Takashi, Kim, Woo-Kyu, Kudo, Takanori, McKenzie, Douglas, Rahman, Dalil, Dammel, Ralph, Lee, SangHo
Published in Journal of Photopolymer Science and Technology (01.01.2003)
Published in Journal of Photopolymer Science and Technology (01.01.2003)
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Journal Article
PIGMENTED PHOTORESISTS FOR COLOR FILTERS
Kudo, Takanori, Nanjo, Yuki, Nozaki, Yuko, Nagao, Kazuya, Yamaguchi, Hidemasa, Kang, Wen-Bing, Pawlowski, Georg
Published in Journal of Photopolymer Science and Technology (1996)
Published in Journal of Photopolymer Science and Technology (1996)
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Journal Article
Optimization of DUV Negative Resists for 0.15 .MU.m Lithography
Kudo, Takanori, Aramaki, Kayo, Pawlowski, Georg
Published in Journal of photopolymer science and technology (1998)
Published in Journal of photopolymer science and technology (1998)
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Journal Article
Materials and Resists for 193 and 157nm Applications
Padmanaban, Munirathna, Alemy, Eric, Bae, Jun-Bom, Kim, Woo-Kyu, Kudo, Takanori, Masuda, Seiya, Rahman, Dalil, Sakamuri, Raj, Dammel, Ralph, Jung, Jae-Chang, Lee, Sung-Koo, Shin, Ki-Soo
Published in Journal of Photopolymer Science and Technology (2001)
Published in Journal of Photopolymer Science and Technology (2001)
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Journal Article
PIGMENTED PHOTORESIST FOR BLACK MATRIX
Kudo, Takanori, Nozaki, Yuko, Nanjo, Yuki, Yamaguchi, Hidemasa, Nagao, Kazuya, Okazaki, Hiroshi, Pawlowski, Georg
Published in Journal of Photopolymer Science and Technology (1996)
Published in Journal of Photopolymer Science and Technology (1996)
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Journal Article
Etch Properties of 193nm Resists: Issues and Approaches
Padmanaban, Munirathna, Alemy, Eric, Dammel, Ralph, Kim, Woo-Kyu, Kudo, Takanori, Lee, SangHo, Rahman, Dalil, Chen, Wan-Lin, Sadjadi, Reza M., Livesay, William, Ross, Matthew
Published in Journal of Photopolymer Science and Technology (2002)
Published in Journal of Photopolymer Science and Technology (2002)
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Journal Article
Optimization of 193nm Contact Hole Resists for 100nm Node
Kudo, Takanori, Alemy, Eric L., Dammel, Ralph R., Kim, Woo-Kyu, Lee, Sang-Ho, Masuda, Seiya, McKenzie, Douglas, Rahman, M. Dalil, Romano, Andrew, Padmanaban, Munirathna, Chun, Jun-Sung, Jung, Jae-Chang, Lee, Sung-Koo, Shin, Ki-Soo, Kim, Hyeong-Soo
Published in Journal of Photopolymer Science and Technology (2002)
Published in Journal of Photopolymer Science and Technology (2002)
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Journal Article
Optimization of 193 nm Contact Hole Resists for 100 nm Node
Kudo, Takanori, Alemy, Eric L., Dammel, Ralph R., Kim, Woo-Kyu, Lee, Sang-Ho, Masuda, Seiya, McKenzie, Douglas, Rahman, M. Dalil, Romano, Andrew, Padmanaban, Munirathna, Chun, Jun-Sung, Jung, Jae-Chang, Lee, Sung-Koo, Shin, Ki-Soo, Kim, Hyeong-Soo
Published in Journal of photopolymer science and technology (2002)
Published in Journal of photopolymer science and technology (2002)
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Journal Article