Etch process for recessing polysilicon in trench structures
Tews, Helmut, Kudelka, Stephan, Michaelis, Alexander, Schroeder, Uwe, Popp, Martin, Schupke, Kristin, Koehler, Daniel
Year of Publication 16.10.2003
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Year of Publication 16.10.2003
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Etch process for recessing polysilicon in trench structures
SCHUPKE KRISTIN, SCHROEDER UWE, KOEHLER DANIEL, TEWS HELMUT, KUDELKA STEPHAN, MICHAELIS ALEXANDER, POPP MARTIN
Year of Publication 16.10.2003
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Year of Publication 16.10.2003
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Method for surface roughness enhancement in semiconductor capacitor manufacturing
SCHROEDER UWE, JAMMY RAJARAO, TEWS HELMUT HORST, KUDELKA STEPHAN, RAHN STEPHEN, MCSTAY IRENE
Year of Publication 02.09.2003
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Year of Publication 02.09.2003
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Method for surface roughness enhancement in semiconductor capacitor manufacturing
Rahn, Stephen, McStay, Irene, Tews, Helmut Horst, Schroeder, Uwe, Kudelka, Stephan, Jammy, Rajarao
Year of Publication 02.09.2003
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Year of Publication 02.09.2003
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Process flow for thick isolation collar with reduced length
Mandelman, Jack A, Divakaruni, Rama, Fehlauer, Gerd, Kudelka, Stephan, Schroeder, Uwe, Tews, Helmut H
Year of Publication 12.08.2003
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Year of Publication 12.08.2003
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Process flow for thick isolation collar with reduced length
DIVAKARUNI RAMA, FEHLAUER GERD, SCHROEDER UWE, TEWS HELMUT H, KUDELKA STEPHAN, MANDELMAN JACK A
Year of Publication 12.08.2003
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Year of Publication 12.08.2003
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Semiconductor structures and manufacturing methods
Tews, Helmut Horst, Michaelis, Alexander, Kudelka, Stephan, Schroeder, Uwe, Jammy, Raj, Gruening, Ulrike
Year of Publication 12.08.2003
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Year of Publication 12.08.2003
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Semiconductor structures and manufacturing methods
GRUENING ULRIKE, SCHROEDER UWE, TEWS HELMUT HORST, MICHAELIS ALEXANDER, KUDELKA STEPHAN, JAMMY RAJ
Year of Publication 12.08.2003
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Year of Publication 12.08.2003
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Vertical gate top engineering for improved GC and CB process windows
KUDELKA, STEPHAN P, JAIPRAKASH, VENKATACHAIAM C, DYER, THOMAS W, RADENS, CARL J
Year of Publication 21.07.2003
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Year of Publication 21.07.2003
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METHOD FOR SURFACE ROUGHNESS ENHANCEMENT IN SEMICONDUCTOR CAPACITOR MANUFACTURING
Rahn, Stephen, McStay, Irene, Tews, Helmut, Schroeder, Uwe, Kudelka, Stephan, Jammy, Rajarao
Year of Publication 19.06.2003
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Year of Publication 19.06.2003
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METHOD FOR SURFACE ROUGHNESS ENHANCEMENT IN SEMICONDUCTOR CAPACITOR MANUFACTURING
SCHROEDER UWE, JAMMY RAJARAO, TEWS HELMUT HORST, KUDELKA STEPHAN, RAHN STEPHEN, MCSTAY IRENE
Year of Publication 19.06.2003
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Year of Publication 19.06.2003
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PROCESS FLOW FOR CAPACITANCE ENHANCEMENT IN A DRAM TRENCH
KUDELKA, STEPHAN, TEWS, HELMUT, MCSTAY, IRENE, JAMMY, RAJARAO, SETTLEMYER, KENNETH, FALTERMEIER, JOHNATHAN, CHUDZIK, MICHAEL
Year of Publication 15.05.2003
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Year of Publication 15.05.2003
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Rough oxide hard mask for DT surface area enhancement for DT DRAM
SCHROEDER UWE, TEWS HELMUT HORST, KUDELKA STEPHAN, RAHN STEPHEN, MCSTAY IRENE
Year of Publication 06.05.2003
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Year of Publication 06.05.2003
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Rough oxide hard mask for DT surface area enhancement for DT DRAM
Kudelka, Stephan, Tews, Helmut Horst, Rahn, Stephen, McStay, Irene, Schroeder, Uwe
Year of Publication 06.05.2003
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Year of Publication 06.05.2003
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Self-isolated gate oxidation for an integrated circuit vertical device
KUDELKA, STEPHAN, MICHAELIS, ALEXANDER, TEWS, HELMUT HORST, BEINTNER, JOCHEN, GRUENING, ULRIKE
Year of Publication 01.04.2003
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Year of Publication 01.04.2003
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GATE OXIDATION FOR VERTICAL TRENCH DEVICE
KUDELKA, STEPHAN, MICHAELIS, ALEXANDER, SCHROEDER, UWE, TEWS, HELMUT, HORST, BEINTNER, JOCHEN, GRUENING, ULRIKE
Year of Publication 19.03.2003
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Year of Publication 19.03.2003
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