Cytomegalovirus viral load in cord blood and impact of congenital infection on markers of hematopoietic progenitor cell potency
Albano, M. Susana, Ciubotariu, Rodica, Dobrila, Ludy, Tarnawski, Michal, DeLeon, Margely, Watanabe, Chiseko, Krishnan, Siddarth, Scaradavou, Andromachi, Rubinstein, Pablo
Published in Transfusion (Philadelphia, Pa.) (01.11.2017)
Published in Transfusion (Philadelphia, Pa.) (01.11.2017)
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Journal Article
Non-Contact, Sub-Surface Detection of Alloy Segregation in Back-End of Line Copper Dual-Damascene Structures
Nag, Joyeeta, Ray, Shishir, Kohli, Kriteshwar K., Simon, Andrew H., Cohen, Brian A., Tijiwa-Birk, Felipe, Parks, Christopher J., Krishnan, Siddarth A.
Published in IEEE transactions on semiconductor manufacturing (01.11.2015)
Published in IEEE transactions on semiconductor manufacturing (01.11.2015)
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Journal Article
Metal Gate-HfO2 MOS structures on GaAs substrate with and without Si interlayer
OK, Injo, KIM, Hyoung-Sub, LEE, Jack C, MANHONG ZHANG, KANG, Chang-Yong, SE JONG RHEE, CHOI, Changhwan, KRISHNAN, Siddarth A, LEE, Tackhwi, FENG ZHU, THAREJA, Gaurav
Published in IEEE electron device letters (01.03.2006)
Published in IEEE electron device letters (01.03.2006)
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Journal Article
Mechanistic understanding of Breakdown and Bias Temperature Instability in High-K Metal devices using inline Fast Ramped Bias Test
Krishnan, Siddarth A, Cartier, Eduard, Stathis, James, Chudzik, Michael, Kerber, Andreas
Published in 2011 International Reliability Physics Symposium (01.04.2011)
Published in 2011 International Reliability Physics Symposium (01.04.2011)
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Conference Proceeding
Aggressively scaled ultrathin undoped HfO2 gate dielectric (EOT < 0.7 nm) with TaN gate electrode using engineered interface layer
CHOI, Changhwan, KANG, Chang-Yong, LEE, Jack C, SE JONG RHEE, AKBAR, Mohammad Shahariar, KRISHNAN, Siddarth A, MANHONG ZHANG, KIM, Hyoung-Sub, LEE, Tackhwi, OK, Injo, FENG ZHU
Published in IEEE electron device letters (01.07.2005)
Published in IEEE electron device letters (01.07.2005)
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Journal Article
Hafnium Titanate bilayer structure multimetal dielectric nMOSCAPs
Se Jong Rhee, Feng Zhu, Hyoung-Sub Kim, Chang Hwan Choi, Chang Yong Kang, Manhong Zhang, Tackhwi Lee, Ok, I., Krishnan, S.A., Lee, J.C.
Published in IEEE electron device letters (01.04.2006)
Published in IEEE electron device letters (01.04.2006)
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Journal Article
Bulk‐Switching Memristor‐Based Compute‐In‐Memory Module for Deep Neural Network Training
Wu, Yuting, Wang, Qiwen, Wang, Ziyu, Wang, Xinxin, Ayyagari, Buvna, Krishnan, Siddarth, Chudzik, Michael, Lu, Wei D.
Published in Advanced materials (Weinheim) (01.11.2023)
Published in Advanced materials (Weinheim) (01.11.2023)
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Journal Article
Positive bias temperature instability effects of Hf-based nMOSFETs with various nitrogen and silicon profiles
Changhwan Choi, Chang-Seok Kang, Chang Yong Kang, Se Jong Rhee, Akbar, M.S., Krishnan, S.A., Manhong Zhang, Lee, J.C.
Published in IEEE electron device letters (01.01.2005)
Published in IEEE electron device letters (01.01.2005)
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Journal Article
Surface Treatment and Functionalization Effects on Chemical Vapor Deposition and Atomic Layer Deposition Grown HfO2
Consiglio, Steven, Mo, Renee, Tai, Tsong-Lin, Krishnan, Siddarth, O'Meara, David, Wajda, Cory, Chudzik, Michael
Published in ECS transactions (27.04.2007)
Published in ECS transactions (27.04.2007)
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Journal Article
Improving channel carrier mobility and immunity to charge trapping of high-K NMOSFET by using stacked Y2O3/HfO2 gate dielectric
FENG ZHU, SE JONG RHEE, LEE, Jack C, CHANG YONG KANG, CHANG HWAN CHOI, AKBAR, Mohammad S, KRISHNAN, Siddarth A, MANHONG ZHANG, KIM, Hyoung-Sub, LEE, Tackwhi, OK, Injo
Published in IEEE electron device letters (01.12.2005)
Published in IEEE electron device letters (01.12.2005)
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Journal Article
Investigation of transient relaxation under static and dynamic stress in Hf-based gate oxides
Akbar, M.S., Changhwan Choi, Se Jong Rhee, Krishnan, S.A., Chang Yong Kang, Man Hong Zhang, Tackhwi Lee, Ok, I., Feng Zhu, Hyoung-Sub Kim, Lee, J.C.
Published in IEEE transactions on electron devices (01.05.2006)
Published in IEEE transactions on electron devices (01.05.2006)
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Journal Article
Modeling of SiC transistor with counter-doped channel
Vyas, Pratik B., Pal, Ashish, Weeks, Stephen, Holt, Joshua, Srivastava, Aseem K., Megalini, Ludovico, Krishnan, Siddarth, Chudzik, Michael, Bazizi, El Mehdi, Ayyagari-Sangamalli, Buvna
Published in Solid-state electronics (01.02.2023)
Published in Solid-state electronics (01.02.2023)
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Journal Article
Novel Materials and Processes in Replacement Metal Gate for Advanced CMOS Technology
Bao, Ruqiang, Hung, Steven, Wang, Miaomiao, Chung, Kisup, Barman, Soumendra, Krishnan, Siddarth A, Yang, Yixiong, Tang, Wei, Li, Luping, Lin, Yongjing, Chan, Michael S, Chen, Zhebo, Miao, Xin, Hopstaken, Marinus, Conti, Richard A, Jagannathan, Hemanth, Chudzik, Michael P, McHerron, Dalea, Haran, Bala S, Natarajan, Sanjay
Published in 2018 IEEE International Electron Devices Meeting (IEDM) (01.12.2018)
Published in 2018 IEEE International Electron Devices Meeting (IEDM) (01.12.2018)
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Conference Proceeding
저전력 동작을 위한 다중 상태 메모리 엘리먼트에서의 불균일한 상태 간격
KAMALANATHAN DEEPAK, KRISHNAN SIDDARTH, CHEVALLIER CHRISTOPHE J, CAI FUXI
Year of Publication 24.11.2022
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Year of Publication 24.11.2022
Patent
Cord Blood Units (CBU) Selected for Transplantation from a Single CB Bank over 10 Years: High Correlation of Potency/Quality Among Pre-Cryopreservation and Post-Thaw Segment Measurements and Time to Engraftment
Albano, Maria S., Dobrila, Ludy, Tarnawski, Michal, Sung, Dorothy, Masson Frenet, Emeline, Romeo, Cynthia, Zhu, Tracy, Watanabe, Chiseko, Zamfir, Dan, Krishnan, Siddarth, Rubinstein, Pablo, Scaradavou, Andromachi
Published in Blood (29.11.2018)
Published in Blood (29.11.2018)
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Journal Article
An 8-bit 20.7 TOPS/W Multi-Level Cell ReRAM-based Compute Engine
Correll, Justin M., Jie, Lu, Song, Seungheun, Lee, Seungjong, Zhu, Junkang, Tang, Wei, Wormald, Luke, Erhardt, Jack, Breil, Nicolas, Quon, Roger, Kamalanathan, Deepak, Krishnan, Siddarth, Chudzik, Michael, Zhang, Zhengya, Lu, Wei D., Flynn, Michael P.
Published in 2022 IEEE Symposium on VLSI Technology and Circuits (VLSI Technology and Circuits) (12.06.2022)
Published in 2022 IEEE Symposium on VLSI Technology and Circuits (VLSI Technology and Circuits) (12.06.2022)
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Conference Proceeding