Search Results - "KOZAWA" :: K.UTB vyhledávací portál

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Theoretical study on defect risks of chemically amplified resists used for extreme ultraviolet lithography

by Kozawa, Takahiro
Published in Japanese Journal of Applied Physics (01.10.2022)

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Journal Article

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Protected unit distribution near interfaces of chemically amplified resists used for extreme ultraviolet lithography

by Kozawa, Takahiro
Published in Japanese Journal of Applied Physics (01.01.2023)

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Journal Article

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Interfacial effects on sensitization of chemically amplified extreme ultraviolet resists

by Kozawa, Takahiro
Published in Japanese Journal of Applied Physics (01.11.2022)

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Journal Article

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Design strategy of extreme ultraviolet resists

by Kozawa, Takahiro
Published in Japanese Journal of Applied Physics (01.05.2024)

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Journal Article

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Focusing property of a double-ring-shaped radially polarized beam

by Kozawa, Yuichi, Sato, Shunichi
Published in Optics letters (15.03.2006)

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Microstructural development of MnCO3 microsphere compacts through hydrothermal hot-pressing

by Kozawa, Takahiro
Published in Journal of the European Ceramic Society (01.04.2022)

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Defect risks at interfaces of chemically amplified resists in extreme ultraviolet lithography process

by Kozawa, Takahiro
Published in Japanese Journal of Applied Physics (01.07.2023)

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Journal Article

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Effects of underlayer absorption coefficient on bridging risk in chemically amplified resist process for extreme ultraviolet lithography

by Kozawa, Takahiro
Published in Japanese Journal of Applied Physics (01.11.2023)

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Relationship between Defect Risks and Effective Reaction Radius for Deprotection in Chemically Amplified Resist Process for Extreme Ultraviolet Lithography

by Kozawa, Takahiro
Published in Journal of Photopolymer Science and Technology (31.05.2024)

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Shielding effect of underlayer against secondary electrons generated in substrate in extreme ultraviolet lithography

by Kozawa, Takahiro
Published in Japanese Journal of Applied Physics (01.01.2024)

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Journal Article

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Formulation of trade-off relationships between resolution, line edge roughness, and sensitivity in sub-10 nm half-pitch region for chemically amplified extreme ultraviolet resists

by Kozawa, Takahiro
Published in Japanese Journal of Applied Physics (01.01.2022)

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Journal Article

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Theoretical study on trade-off relationships between resolution, line edge roughness, and sensitivity in resist processes for semiconductor manufacturing by extreme ultraviolet lithography

by Kozawa, Takahiro
Published in Japanese Journal of Applied Physics (01.09.2019)

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Journal Article

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Lattice deformation of LiNi0.5Mn1.5O4 spinel cathode for Li-ion batteries by ball milling

by Kozawa, Takahiro
Published in Journal of power sources (15.04.2019)

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Journal Article

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Combined wet milling and heat treatment in water vapor for producing amorphous to crystalline ultrafine Li 1.3 Al 0.3 Ti 1.7 (PO 4 ) 3 solid electrolyte particles

by Kozawa, Takahiro
Published in RSC advances (21.04.2021)

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Journal Article

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Novel method for screening probiotic candidates tolerant to human gastrointestinal stress

by Kozawa, Takuma, Aoyagi, Hideki
Published in Journal of microbiological methods (01.07.2024)

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Journal Article

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Optical trapping of micrometer-sized dielectric particles by cylindrical vector beams

by Kozawa, Yuichi, Sato, Shunichi
Published in Optics express (10.05.2010)

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Journal Article

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Selective Multi-pulse Pulse Position Modulation for Lighting Constrained Visible Light Communications

by Kozawa, Yusuke
Published in 2024 IEEE International Symposium on Circuits and Systems (ISCAS) (19.05.2024)

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Conference Proceeding

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Generation of a radially polarized laser beam by use of a conical Brewster prism

by Kozawa, Yuichi, Sato, Shunichi
Published in Optics letters (15.11.2005)

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Journal Article

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Relationship between the surface free energy of underlayers and the dissolution kinetics of poly(4-hydroxystyrene) partially protected by t-butoxycarbonyl groups in tetramethylammonium hydroxide aqueous developer

by Wang, Jiahao, Kozawa, Takahiro
Published in Japanese Journal of Applied Physics (02.09.2024)

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Journal Article

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Dissolution dynamics of poly(4-hydroxystyrene) partially protected with t-butoxycarbonyl group in alkyltrimethylammonium hydroxide aqueous developers

by Wang, Jiahao, Kozawa, Takahiro
Published in Japanese Journal of Applied Physics (01.07.2024)

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Journal Article

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