Capacitance-voltage study of single-crystalline Si dots on ultrathin buried SiO2 formed by nanometer-scale local oxidation
ISHIKAWA, Y, KOSUGI, M, KUMEZAWA, M, TSUCHIYA, T, TABE, M
Published in Thin solid films (03.07.2000)
Published in Thin solid films (03.07.2000)
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