Synthesis and Evaluation of novel PAGs for ArF Lithography
Kodama, Kunihiko, Sato, Kenichiro, Tan, Shiro, Nishiyama, Fumiyuki, Yamanaka, Tsukasa, Kanna, Shinnichi, Takahashi, Hyou, Kawabe, Yasumasa, Momota, Makoto, Kokubo, Tadayoshi
Published in Journal of Photopolymer Science and Technology (01.01.2004)
Published in Journal of Photopolymer Science and Technology (01.01.2004)
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A HFIPS-based Polymer Approach for 157 nm Single Layer Photoresist
Kanna, Shinichi, Mizutani, Kazuyoshi, Yasunami, Shoichiro, Kawabe, Yasumasa, Tan, Shiro, Yagihara, Morio, Kokubo, Tadayoshi, Malik, Sanjay, Dilocker, Stephanie
Published in Journal of Photopolymer Science and Technology (01.01.2003)
Published in Journal of Photopolymer Science and Technology (01.01.2003)
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Journal Article
Modified Acetal Approach to 157nm Resist Design
Malik, Sanjay, Dilocker, Stephanie, Eisele, Jeff, De, Binod, Bowden, Murrae, Scales, Scott, Hatfield, John, Blakeney, Andrew, Tzviatkov, Plamen, Kokubo, Tadayoshi
Published in Journal of Photopolymer Science and Technology (01.01.2002)
Published in Journal of Photopolymer Science and Technology (01.01.2002)
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Recent Advances in Acetal-Based BUY Resists
Malik, Sanjay, Blakeney, Andrew J., Ferreira, Lawrence, Maxwell, Brian, Driessche, Veerle van, Whewell, Allyn, Sarubbi, Thomas R., Bowden, Murrae J., Fujimori, Toru, Tan, Shiro, Aoai, Toshiaki, Uenishi, Kazuya, Kawabe, Yasumasa, Kokubo, Tadayoshi
Published in Journal of Photopolymer Science and Technology (1999)
Published in Journal of Photopolymer Science and Technology (1999)
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Photoreaction of Acetoacetate
Tada, Masaru, Kokubo, Tadayoshi, Sato, Tadashi
Published in Bulletin of the Chemical Society of Japan (01.07.1970)
Published in Bulletin of the Chemical Society of Japan (01.07.1970)
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