Growth of metastable 2H-CaSi2 films on Si(111) substrates with ultrathin SiO2 films by solid phase epitaxy
Oh-ishi, Keiichiro, Kojima, Mikio, Yoshizaki, Takashi, Shibagaki, Arata, Ishibe, Takafumi, Nakamura, Yoshiaki, Nakano, Hideyuki
Published in Applied physics express (01.01.2024)
Published in Applied physics express (01.01.2024)
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Journal Article
Growth of metastable 2H-CaSi 2 films on Si(111) substrates with ultrathin SiO 2 films by solid phase epitaxy
Oh-ishi, Keiichiro, Kojima, Mikio, Yoshizaki, Takashi, Shibagaki, Arata, Ishibe, Takafumi, Nakamura, Yoshiaki, Nakano, Hideyuki
Published in Applied physics express (01.01.2024)
Published in Applied physics express (01.01.2024)
Get full text
Journal Article
Photomask Blank Photomask and Method of Manufacture
INAZUKI YUKIO, KOJIMA MIKIO, MARUYAMA TAMOTSU, OKAZAKI SATOSHI, KANEKO HIDEO, SHINAGAWA TSUTOMU
Year of Publication 11.09.2002
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Year of Publication 11.09.2002
Patent