Highly Conducting, Transparent, and Flexible Indium Oxide Thin Film Prepared by Atomic Layer Deposition Using a New Liquid Precursor Et2InN(SiMe3)2
Maeng, Wan Joo, Choi, Dong-won, Chung, Kwun-Bum, Koh, Wonyong, Kim, Gi-Yeop, Choi, Si-Young, Park, Jin-Seong
Published in ACS applied materials & interfaces (22.10.2014)
Published in ACS applied materials & interfaces (22.10.2014)
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Growth of magnesium oxide thin films using single molecular precursors by metal–organic chemical vapor deposition
Boo, Jin-Hyo, Lee, Soon-Bo, Yu, Kyu-Sang, Koh, Wonyong, Kim, Yunsoo
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Published in Thin solid films (12.03.1999)
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Atomic layer deposition and tellurization of Ge-Sb film for phase-change memory applications
Kim, Yewon, Han, Byeol, Kim, Yu-Jin, Shin, Jeeyoon, Kim, Seongyoon, Hidayat, Romel, Park, Jae-Min, Koh, Wonyong, Lee, Won-Jun
Published in RSC advances (03.06.2019)
Published in RSC advances (03.06.2019)
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