Projection mask-less lithography (PML2): First results from the multi beam blanking demonstrator
Eder-Kapl, Stefan, Haugeneder, Ernst, Langfischer, Helmut, Reimer, Klaus, Eichholz, Joerg, Witt, Martin, Doering, Hans-Joachim, Heinitz, Joachim, Brandstaetter, Christoph
Published in Microelectronic engineering (01.04.2006)
Published in Microelectronic engineering (01.04.2006)
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Journal Article
Conference Proceeding
Precisely Assembled Multi Deflection Arrays – Key Components for Multi Shaped Beam Lithography
Mohaupt, Matthias, Beckert, Erik, Burkhardt, Thomas, Hornaff, Marcel, Damm, Christoph, Eberhardt, Ramona, Tünnermann, Andreas, Döring, Hans-Joachim, Reimer, Klaus
Published in Precision Assembly Technologies and Systems
Published in Precision Assembly Technologies and Systems
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Book Chapter
LAGESTABILE POSITIONIERUNG AKTIV BEWEGLICHER EINZELLER
REIMER, KLAUS, LUCAS, KURT, FUHR, GUENTER, MUELLER, TORSTEN, WAGNER, BERND
Year of Publication 15.04.2004
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Year of Publication 15.04.2004
Patent