Search Results - "KLATT JEFFREY" :: K.UTB vyhledávací portál | TBU Library Retrieval Portal

Characterization of Doped Oxide Films PSG/BPSG/FSG via DSIMS in Order to Eliminate Nonzero Kilometer Failures from Semiconductors Used in Automotive Industry : Topic/category: Yield Enhancment/Advanced Metrology

Characterization of Doped Oxide Films PSG/BPSG/FSG via DSIMS in Order to Eliminate Nonzero Kilometer Failures from Semiconductors Used in Automotive Industry : Topic/category: Yield Enhancment/Advanced Metrology

by Budri, Thanas, Klatt, Jeffrey
Published in 2020 31st Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC) (01.08.2020)

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Conference Proceeding

Semiconductor Film Stack Interface Investigation via DSIMS & TOFSIMS Depth Profiling and HAXPES : Yield Enhancement/Learning

Semiconductor Film Stack Interface Investigation via DSIMS & TOFSIMS Depth Profiling and HAXPES : Yield Enhancement/Learning

by Budri, Thanas, Klatt, Jeffrey, Chung, Jayhoon, Clubb, Aaron, Mann, Jennifer, Artyushkova, Kateryna
Published in 2023 34th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC) (01.05.2023)

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Conference Proceeding

Bipolar NPN ICEO leakage due to PETEOS deposition

Bipolar NPN ICEO leakage due to PETEOS deposition

by Klatt, Jeffrey, Arsenault, Scott, Budri, Thanas
Published in 2017 28th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC) (01.05.2017)

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Conference Proceeding

D & TOF-SIMS failure analysis of P-buried layer from BiCMOS transistors

D & TOF-SIMS failure analysis of P-buried layer from BiCMOS transistors

by Budri, Thanas, Sehgal, Akshey, Arsenault, Scott, Klatt, Jeffrey, Noort, Wibo Van, Ruby, Scott, Ramdani, Jamal, Allard, Paul, Schnieders, Albert
Published in Surface and interface analysis (01.01.2011)

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Journal Article Conference Proceeding

Developing a high volume manufacturing method to eliminate P Buried Layer implant defects

Developing a high volume manufacturing method to eliminate P Buried Layer implant defects

by Sehgal, Akshey, Budri, Thanas, Klatt, Jeffrey, Printy, Craig, Ruby, Scott, Ramdani, Jamal
Published in 2010 IEEE/SEMI Advanced Semiconductor Manufacturing Conference (ASMC) (01.07.2010)

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Conference Proceeding

Semiconducture structure and method of forming the semiconductor structure that provides two individual resistors or a capacitor

Semiconducture structure and method of forming the semiconductor structure that provides two individual resistors or a capacitor

by KLATT JEFFREY
Year of Publication 16.04.2013

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Patent

SEMICONDUCTURE STRUCTURE AND METHOD OF FORMING THE SEMICONDUCTOR STRUCTURE THAT PROVIDES TWO INDIVIDUAL RESISTORS OR A CAPACITOR

SEMICONDUCTURE STRUCTURE AND METHOD OF FORMING THE SEMICONDUCTOR STRUCTURE THAT PROVIDES TWO INDIVIDUAL RESISTORS OR A CAPACITOR

by KLATT JEFFREY
Year of Publication 27.09.2012

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Patent

Semiconductor structure and method of forming the semiconductor structure that provides two individual resistors or a capacitor

Semiconductor structure and method of forming the semiconductor structure that provides two individual resistors or a capacitor

by Klatt, Jeffrey
Year of Publication 05.06.2012

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Patent

Semiconductor structure and method of forming the semiconductor structure that provides two individual resistors or a capacitor

Semiconductor structure and method of forming the semiconductor structure that provides two individual resistors or a capacitor

by KLATT JEFFREY
Year of Publication 05.06.2012

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Patent

Semiconducture Structure and Method of Forming the Semiconductor Structure that Provides Two Individual Resistors or a Capacitor

Semiconducture Structure and Method of Forming the Semiconductor Structure that Provides Two Individual Resistors or a Capacitor

by KLATT JEFFREY
Year of Publication 01.12.2011

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Patent

IONIZED METAL PLASMA DEPOSITION PROCESS HAVING ENHANCED VIA SIDEWALL COVERAGE

IONIZED METAL PLASMA DEPOSITION PROCESS HAVING ENHANCED VIA SIDEWALL COVERAGE

by KLATT, JEFFREY, NORASETTHEKUL, SOMCHINTANA
Year of Publication 10.09.2003

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Patent

IONIZED METAL PLASMA DEPOSITION PROCESS HAVING ENHANCED VIA SIDEWALL COVERAGE

IONIZED METAL PLASMA DEPOSITION PROCESS HAVING ENHANCED VIA SIDEWALL COVERAGE

by KLATT, JEFFREY, NORASETTHEKUL, SOMCHINTANA
Year of Publication 05.12.2002

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Patent

Ionized metal plasma deposition process having enhanced via sidewall coverage

Ionized metal plasma deposition process having enhanced via sidewall coverage

by NORASETTHEKUL SOMCHINTANA, KLATT JEFFREY
Year of Publication 27.08.2002

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Patent

Ionized metal plasma deposition process having enhanced via sidewall coverage

Ionized metal plasma deposition process having enhanced via sidewall coverage

by Klatt, Jeffrey, Norasetthekul, Somchintana
Year of Publication 27.08.2002

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Patent

IONIZED METAL PLASMA DEPOSITION PROCESS HAVING ENHANCED VIA SIDEWALL COVERAGE

IONIZED METAL PLASMA DEPOSITION PROCESS HAVING ENHANCED VIA SIDEWALL COVERAGE

by KLATT, JEFFREY, NORASETTHEKUL, SOMCHINTANA
Year of Publication 13.06.2002

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Patent

Ionized metal plasma deposition process having enhanced via sidewall coverage

Ionized metal plasma deposition process having enhanced via sidewall coverage

by Norasetthekul, Somchintana, Klatt, Jeffrey
Year of Publication 06.06.2002

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Patent

Ionized metal plasma deposition process having enhanced via sidewall coverage

Ionized metal plasma deposition process having enhanced via sidewall coverage

by NORASETTHEKUL SOMCHINTANA, KLATT JEFFREY
Year of Publication 06.06.2002

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Patent