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Year of Publication 19.08.2008
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Year of Publication 19.08.2008
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Sulfonamide compound, polymer compound, resist material and pattern formation method
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Year of Publication 19.08.2008
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Year of Publication 19.08.2008
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Year of Publication 27.05.2008
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Year of Publication 27.05.2008
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Resist material and pattern formation method
Kishimura, Shinji, Endo, Masayuki, Sasago, Masaru, Ueda, Mitsuru, Imori, Hirokazu, Fukuhara, Toshiaki
Year of Publication 27.05.2008
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Year of Publication 27.05.2008
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Pattern forming material and method of pattern formation
UEDA MITSURU, KISHIMURA SHINJI, SASAGO MASARU, ENDO MASAYUKI, FUJIGAYA TSUYOHIKO
Year of Publication 14.12.2004
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Year of Publication 14.12.2004
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Pattern forming material and method of pattern formation
Kishimura, Shinji, Endo, Masayuki, Sasago, Masaru, Ueda, Mitsuru, Fujigaya, Tsuyohiko
Year of Publication 14.12.2004
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Year of Publication 14.12.2004
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Pattern formation material and pattern formation method
Kishimura, Shinji, Endo, Masayuki, Sasago, Masaru, Ueda, Mitsuru, Fujigaya, Tsuyohiko
Year of Publication 19.10.2004
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Year of Publication 19.10.2004
Patent
Pattern formation material and pattern formation method
UEDA MITSURU, KISHIMURA SHINJI, SASAGO MASARU, ENDO MASAYUKI, FUJIGAYA TSUYOHIKO
Year of Publication 19.10.2004
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Year of Publication 19.10.2004
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Pattern-forming material and method of forming pattern
ENDO MASAYUKI,SASAGO MASARU,UEDA MITSURU,FUJIGAYA TSUYOHIKO,KISHIMURA SHINJI
Year of Publication 25.08.2004
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Year of Publication 25.08.2004
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