HIGH POLYMER COMPOUND, RESIST MATERIAL AND PATTERN- FORMING METHOD
WATANABE ATSUSHI, ENDO MASATAKA, HARADA YUJI, SASAKO MASARU, KISHIMURA SHINJI, TSUTSUMI KENTARO, HATAKEYAMA JUN, MIYAZAWA SATORU, OTANI MITSUTAKA, MAEDA KAZUHIKO
Year of Publication 09.08.2002
Get full text
Year of Publication 09.08.2002
Patent
HIGH POLYMER COMPOUND, RESIST MATERIAL AND PATTERN- FORMING METHOD
WATANABE ATSUSHI, ENDO MASATAKA, HARADA YUJI, SASAKO MASARU, KISHIMURA SHINJI, TSUTSUMI KENTARO, HATAKEYAMA JUN, MIYAZAWA SATORU, OTANI MITSUTAKA, MAEDA KAZUHIKO
Year of Publication 09.08.2002
Get full text
Year of Publication 09.08.2002
Patent
HIGH POLYMER COMPOUND, RESIST MATERIAL AND PATTERN- FORMING METHOD
WATANABE ATSUSHI, ENDO MASATAKA, HARADA YUJI, SASAKO MASARU, KISHIMURA SHINJI, TSUTSUMI KENTARO, HATAKEYAMA JUN, MIYAZAWA SATORU, OTANI MITSUTAKA, MAEDA KAZUHIKO
Year of Publication 09.08.2002
Get full text
Year of Publication 09.08.2002
Patent
POLYMER COMPOUND, RESIST MATERIAL, AND METHOD FOR PATTERN FORMATION
WATANABE ATSUSHI, ENDO MASATAKA, HARADA YUJI, SASAKO MASARU, KISHIMURA SHINJI, TSUTSUMI KENTARO, HATAKEYAMA JUN, MIYAZAWA SATORU, OTANI MITSUTAKA, MAEDA KAZUHIKO
Year of Publication 31.07.2002
Get full text
Year of Publication 31.07.2002
Patent
Resist compositions and patterning process
HARADA YUJI, WATANABE JUN, OOTANI MICHITAKA, KISHIMURA SHINJI, TSUTSUMI KENTARO, KAWAI YOSHIO, SASAGO MASARU, HATAKEYAMA JUN, MIYAZAWA SATORU, ENDO MASAYUKI, MAEDA KAZUHIKO
Year of Publication 14.09.2004
Get full text
Year of Publication 14.09.2004
Patent
Resist compositions and patterning process
Hatakeyama, Jun, Harada, Yuji, Watanabe, Jun, Kawai, Yoshio, Sasago, Masaru, Endo, Masayuki, Kishimura, Shinji, Ootani, Michitaka, Miyazawa, Satoru, Tsutsumi, Kentaro, Maeda, Kazuhiko
Year of Publication 14.09.2004
Get full text
Year of Publication 14.09.2004
Patent
FORMATION OF PATTERN
KUBOTA SHIGERU, KUMADA TERUHIKO, KISHIMURA SHINJI, HIZUKA YUJI, NAGATA KAZUSHI
Year of Publication 22.05.1992
Get full text
Year of Publication 22.05.1992
Patent
POSITIVE TYPE PHOTOSENSITIVE COMPOSITION
KUBOTA SHIGERU, KUMADA TERUHIKO, KISHIMURA SHINJI, HIZUKA YUJI, NAGATA KAZUSHI
Year of Publication 22.05.1992
Get full text
Year of Publication 22.05.1992
Patent
RESIST MATERIAL AND METHOD FOR FORMING AND REMOVING PATTERN OF THE MATERIAL
KISHIMURA SHINJI, FUJIOKA HIROFUMI, NAGATA KAZUSHI, YOSHIDA YASUHIRO, NAKAJIMA HIROYUKI
Year of Publication 19.05.1992
Get full text
Year of Publication 19.05.1992
Patent
PATTERN FORMING METHOD
KISHIMURA SHINJI, FUJIOKA HIROFUMI, NAGATA KAZUSHI, YOSHIDA YASUHIRO, NAKAJIMA HIROYUKI
Year of Publication 28.04.1992
Get full text
Year of Publication 28.04.1992
Patent
Polymers, resist compositions and patterning process
Harada, Yuji, Hatakeyama, Jun, Watanabe, Jun, Kawai, Yoshio, Sasago, Masaru, Endo, Masayuki, Kishimura, Shinji, Ootani, Michitaka, Miyazawa, Satoru, Tsutsumi, Kentaro, Maeda, Kazuhiko
Year of Publication 23.03.2004
Get full text
Year of Publication 23.03.2004
Patent
Polymers, resist compositions and patterning process
HARADA YUJI, WATANABE JUN, OOTANI MICHITAKA, KISHIMURA SHINJI, TSUTSUMI KENTARO, KAWAI YOSHIO, SASAGO MASARU, HATAKEYAMA JUN, MIYAZAWA SATORU, ENDO MASAYUKI, MAEDA KAZUHIKO
Year of Publication 23.03.2004
Get full text
Year of Publication 23.03.2004
Patent
Approach of various polymers to 157 nm single-layer resists
Kishimura, S., Sasago, M., Shirai, M., Tsunooka, M.
Published in Digest of Papers Microprocesses and Nanotechnology 2000. 2000 International Microprocesses and Nanotechnology Conference (IEEE Cat. No.00EX387) (2000)
Published in Digest of Papers Microprocesses and Nanotechnology 2000. 2000 International Microprocesses and Nanotechnology Conference (IEEE Cat. No.00EX387) (2000)
Get full text
Conference Proceeding
Lithography solution for 65-nm node system LSIs
Matsuo, T., Endo, M., Kishimura, S., Misaka, A., Sasago, M.
Published in 2002 Symposium on VLSI Technology. Digest of Technical Papers (Cat. No.01CH37303) (2002)
Published in 2002 Symposium on VLSI Technology. Digest of Technical Papers (Cat. No.01CH37303) (2002)
Get full text
Conference Proceeding
RESIST MATERIAL AND STRIPPING METHOD THEREOF
KISHIMURA SHINJI, FUJIOKA HIROFUMI, NAGATA KAZUSHI, YOSHIDA YASUHIRO, NAKAJIMA HIROYUKI
Year of Publication 02.12.1991
Get full text
Year of Publication 02.12.1991
Patent
POSITIVE TYPE PHOTORESIST
KAMEYAMA YASUHIRO, KISHIMURA SHINJI, UOTANI SHIGEO, KINE CHIE, OCHIAI TAMEICHI
Year of Publication 23.04.1990
Get full text
Year of Publication 23.04.1990
Patent
Polymer, resist composition, and patterning process
HATAKEYAMA, JUN, HARADA, YUJI, KISHIMURA, SHINJI, MAEDA, KAZUHIKO, KAWAI, YOSHIO, YAMANAKA, KAZUHIRO, SASAGO, MASARU, KOMORIYA, HARUHIKO, ENDO, MASAYUKI
Year of Publication 01.09.2010
Get full text
Year of Publication 01.09.2010
Patent
Polymers, resist compositions and patterning process
HARADA YUJI, WATANABE JUN, OOTANI MICHITAKA, KISHIMURA SHINJI, TSUTSUMI KENTARO, KAWAI YOSHIO, SASAGO MASARU, HATAKEYAMA JUN, MIYAZAWA SATORU, ENDO MASAYUKI, MAEDA KAZUHIKO
Year of Publication 24.06.2003
Get full text
Year of Publication 24.06.2003
Patent