Polymers, resist compositions and patterning process
Hatakeyama, Jun, Harada, Yuji, Kawai, Yoshio, Sasago, Masaru, Endo, Masayuki, Kishimura, Shinji, Maeda, Kazuhiko, Ootani, Michitaka, Komoriya, Haruhiko
Year of Publication 12.02.2004
Get full text
Year of Publication 12.02.2004
Patent
NEW ESTER COMPOUND, POLYMER COMPOUND, RESIST MATERIAL AND PATTERN-FORMING METHOD
ENDO MASATAKA, HARADA YUJI, SASAKO MASARU, KISHIMURA SHINJI, KOMORIYA HARUHIKO, KAWAI YOSHIO, HATAKEYAMA JUN, OTANI MITSUTAKA, MAEDA KAZUHIKO
Year of Publication 08.01.2004
Get full text
Year of Publication 08.01.2004
Patent
POLYMER COMPOUND, RESIST MATERIAL AND PATTERN-FORMING METHOD
ENDO MASATAKA, HARADA YUJI, SASAKO MASARU, KISHIMURA SHINJI, KOMORIYA HARUHIKO, KAWAI YOSHIO, HATAKEYAMA JUN, OTANI MITSUTAKA, MAEDA KAZUHIKO
Year of Publication 08.01.2004
Get full text
Year of Publication 08.01.2004
Patent
Novel esters, polymers, resist compositions and patterning process
HARADA YUJI, OOTANI MICHITAKA, KISHIMURA SHINJI, KOMORIYA HARUHIKO, KAWAI YOSHIO, SASAGO MASARU, HATAKEYAMA JUN, ENDO MASAYUKI, MAEDA KAZUHIKO
Year of Publication 27.11.2003
Get full text
Year of Publication 27.11.2003
Patent
Novel esters, polymers, resist compositions and patterning process
Hatakeyama, Jun, Harada, Yuji, Kawai, Yoshio, Sasago, Masaru, Endo, Masayuki, Kishimura, Shinji, Maeda, Kazuhiko, Ootani, Michitaka, Komoriya, Haruhiko
Year of Publication 27.11.2003
Get full text
Year of Publication 27.11.2003
Patent
Polymers, resist compositions and patterning process
HARADA YUJI, OOTANI MICHITAKA, KISHIMURA SHINJI, KOMORIYA HARUHIKO, KAWAI YOSHIO, SASAGO MASARU, HATAKEYAMA JUN, ENDO MASAYUKI, MAEDA KAZUHIKO
Year of Publication 20.11.2003
Get full text
Year of Publication 20.11.2003
Patent
Polymers, resist compositions and patterning process
Hatakeyama, Jun, Harada, Yuji, Kawai, Yoshio, Sasago, Masaru, Endo, Masayuki, Kishimura, Shinji, Maeda, Kazuhiko, Ootani, Michitaka, Komoriya, Haruhiko
Year of Publication 20.11.2003
Get full text
Year of Publication 20.11.2003
Patent
Method of forming and removing resist pattern
NAKAJIMA; HIROYUKI, FUJIOKA; HIROFUMI, NAGATA; HITOSHI, YOSHIDA; YASUHIRO, KISHIMURA; SHINJI
Year of Publication 20.06.1995
Get full text
Year of Publication 20.06.1995
Patent
POLYMER COMPOUND, CHEMICALLY AMPLIFIED RESIST MATERIAL AND METHOD FOR FORMING PATTERN
WATANABE ATSUSHI, HARADA YUJI, NAKAJIMA MUTSUO, SASAKO MASARU, KISHIMURA SHINJI, HATAKEYAMA JUN
Year of Publication 29.05.2001
Get full text
Year of Publication 29.05.2001
Patent
Polymers, resist compositions and patterning process
Hatakeyama, Jun, Harada, Yuji, Kawai, Yoshio, Sasago, Masaru, Endo, Masayuki, Kishimura, Shinji, Maeda, Kazuhiko, Ootani, Michitaka, Komoriya, Haruhiko
Year of Publication 04.09.2003
Get full text
Year of Publication 04.09.2003
Patent
Polymers, resist compositions and patterning process
HARADA YUJI, OOTANI MICHITAKA, KISHIMURA SHINJI, KOMORIYA HARUHIKO, KAWAI YOSHIO, SASAGO MASARU, HATAKEYAMA JUN, ENDO MASAYUKI, MAEDA KAZUHIKO
Year of Publication 04.09.2003
Get full text
Year of Publication 04.09.2003
Patent
Ester compounds
HARADA YUJI, OOTANI MICHITAKA, KISHIMURA SHINJI, KOMORIYA HARUHIKO, KAWAI YOSHIO, SASAGO MASARU, HATAKEYAMA JUN, ENDO MASAYUKI, MAEDA KAZUHIKO
Year of Publication 05.08.2003
Get full text
Year of Publication 05.08.2003
Patent
Ester compounds
Harada, Yuji, Hatakeyama, Jun, Kawai, Yoshio, Sasago, Masaru, Endo, Masayuki, Kishimura, Shinji, Maeda, Kazuhiko, Ootani, Michitaka, Komoriya, Haruhiko
Year of Publication 05.08.2003
Get full text
Year of Publication 05.08.2003
Patent
POLYMER COMPOUND, RESIST MATERIAL AND PATTERN FORMING METHOD
ENDO MASATAKA, HARADA YUJI, SASAKO MASARU, KISHIMURA SHINJI, KOMORIYA HARUHIKO, KAWAI YOSHIO, HATAKEYAMA JUN, OTANI MITSUTAKA, MAEDA KAZUHIKO
Year of Publication 09.07.2003
Get full text
Year of Publication 09.07.2003
Patent
POLYMER COMPOUND, RESIST MATERIAL, AND PROCESS FOR FORMING PATTERN
ENDO MASATAKA, HARADA YUJI, SASAKO MASARU, KISHIMURA SHINJI, KOMORIYA HARUHIKO, KAWAI YOSHIO, HATAKEYAMA JUN, OTANI MITSUTAKA, MAEDA KAZUHIKO
Year of Publication 09.07.2003
Get full text
Year of Publication 09.07.2003
Patent
POLYMER COMPOUND, RESIST MATERIAL, AND PROCESS FOR FORMING PATTERN
ENDO MASATAKA, HARADA YUJI, SASAKO MASARU, KISHIMURA SHINJI, KOMORIYA HARUHIKO, KAWAI YOSHIO, HATAKEYAMA JUN, OTANI MITSUTAKA, MAEDA KAZUHIKO
Year of Publication 09.07.2003
Get full text
Year of Publication 09.07.2003
Patent
POLYMER COMPOUND, RESIST MATERIAL, AND PROCESS FOR FORMING PATTERN
ENDO MASATAKA, HARADA YUJI, SASAKO MASARU, KISHIMURA SHINJI, KOMORIYA HARUHIKO, KAWAI YOSHIO, HATAKEYAMA JUN, OTANI MITSUTAKA, MAEDA KAZUHIKO
Year of Publication 09.07.2003
Get full text
Year of Publication 09.07.2003
Patent
CHEMICALLY AMPLIFIED RESIST MATERIAL AND PATTERNING PROCESS
ENDO MASATAKA, HARADA YUJI, SASAKO MASARU, KISHIMURA SHINJI, KOMORIYA HARUHIKO, KAWAI YOSHIO, HATAKEYAMA JUN, OTANI MITSUTAKA, MAEDA KAZUHIKO
Year of Publication 27.06.2003
Get full text
Year of Publication 27.06.2003
Patent
NOVEL ESTER COMPOUND
ENDO MASATAKA, HARADA YUJI, SASAKO MASARU, KISHIMURA SHINJI, KOMORIYA HARUHIKO, KAWAI YOSHIO, HATAKEYAMA JUN, OTANI MITSUTAKA, MAEDA KAZUHIKO
Year of Publication 03.06.2003
Get full text
Year of Publication 03.06.2003
Patent
Chemically amplified resist compositions and patterning process
HARADA YUJI, OOTANI MICHITAKA, KISHIMURA SHINJI, KOMORIYA HARUHIKO, KAWAI YOSHIO, SASAGO MASARU, HATAKEYAMA JUN, ENDO MASAYUKI, MAEDA KAZUHIKO
Year of Publication 29.05.2003
Get full text
Year of Publication 29.05.2003
Patent