Mechanism of porous low- k film damage induced by plasma etching radicals
Iba, Y., Ozaki, S., Sasaki, M., Kobayashi, Y., Kirimura, T., Nakata, Y.
Published in Microelectronic engineering (01.03.2010)
Published in Microelectronic engineering (01.03.2010)
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Journal Article
Conference Proceeding
Quantitative analysis of thermally induced desorption during halogen-etching of a silicon (1 1 1) surface
Shudo, K., Kirimura, T., Tanaka, Y., Ishikawa, T., Tanaka, M.
Published in Surface science (15.08.2006)
Published in Surface science (15.08.2006)
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Journal Article
Nano-cluster formation in halogen etching on Cl/Si(1 1 1)-7 × 7
Shudo, K., Kirimura, T., Kaneko, N., Takahashi, M., Tanaka, Y., Ishikawa, T., Tanaka, M., Nakagawa, H., Asakura, S.
Published in Surface science (01.09.2004)
Published in Surface science (01.09.2004)
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Journal Article
Copper electromigration failure times evaluated over a wide range of voiding phases
Yunlong Li, Croes, K., Kirimura, T., Siew, Y. K., Tokei, Z.
Published in 2012 IEEE International Reliability Physics Symposium (IRPS) (01.04.2012)
Published in 2012 IEEE International Reliability Physics Symposium (IRPS) (01.04.2012)
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Conference Proceeding
Initial void chacterization in 30nm wide polycrystalline Cu line using a local sense EM test structure
Kirimura, T., Croes, K., Yunlong Li, Demuynck, S., Wilson, C. J., Lofrano, M., Tokei, Z.
Published in 2012 IEEE International Reliability Physics Symposium (IRPS) (01.04.2012)
Published in 2012 IEEE International Reliability Physics Symposium (IRPS) (01.04.2012)
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Conference Proceeding
Surface modification of Cl-adsorbed Si(1 1 1)-7 x 7 by the irradiation of infrared pulsed laser
Kirimura, T, Shirao, T, Shudo, K-i, Tanaka, Y, Ishikawa, T, Tanaka, M
Published in Surface science (20.09.2004)
Published in Surface science (20.09.2004)
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Journal Article
Hormonal Regulation of the Human Ghrelin Receptor Gene Transcription
Kaji, Hidesuke, Kishimoto, Masahiko, Kirimura, Tomoko, Iguchi, Genzou, Murata, Masahiro, Yoshioka, Shirou, Iida, Keiji, Okimura, Yasuhiko, Yoshimoto, Yoshio, Chihara, Kazuo
Published in Biochemical and biophysical research communications (15.06.2001)
Published in Biochemical and biophysical research communications (15.06.2001)
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Journal Article
Nano-cluster formation in halogen etching on Cl/Si(1 1 1)-7 × 7
SHUDO, K, KIRIMURA, T, KANEKO, N, TAKAHASHI, M, TANAKA, Y, ISHIKAWA, T, TANAKA, M, NAKAGAWA, H, ASAKURA, S
Published in Surface science (2004)
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Published in Surface science (2004)
Conference Proceeding
Void nucleation and growth during electromigration in 30 nm wide Cu lines: Impact of different interfaces on failure mode
Kirimura, T., Croes, K., Siew, Y. K., Vanstreels, K., Czarnecki, P., Ei-Mekki, Z., van der Veen, M. H., Dictus, D., Yoon, A., Kolics, A., Bommcls, J., Tokei, Zs
Published in 2013 IEEE International Interconnect Technology Conference - IITC (01.06.2013)
Published in 2013 IEEE International Interconnect Technology Conference - IITC (01.06.2013)
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Conference Proceeding
Integration of a k=2.3 spin-on polymer for the sub-28nm technology node using EUV lithography
Wilson, C. J., Lazzarino, F., Truffert, V., Kirimura, T., de Marneffe, J., Verdonck, P., Hirai, M., Nakatani, K., Tada, M., Heylen, N., El-Mekki, Z., Vanstreels, K., Van Besien, E., Ciofi, I., Stucchi, M., Croes, K., Zhang, L., Demuynck, S., Ercken, M., Xu, K., Baklanov, M., Tokei, Z.
Published in 2012 IEEE International Interconnect Technology Conference (01.06.2012)
Published in 2012 IEEE International Interconnect Technology Conference (01.06.2012)
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Conference Proceeding
Novel low-k SiOC (k=2.4) with superior tolerance to direct polish and ashing for advanced BEOL integration
Asami, N., Owada, T., Akiyama, S., Ohara, N., Iba, Y., Kouno, T., Kudo, H., Takesako, S., Osada, T., Kirimura, T., Watatani, H., Uedono, A., Nara, Y., Kase, M.
Published in 2009 IEEE International Interconnect Technology Conference (01.06.2009)
Published in 2009 IEEE International Interconnect Technology Conference (01.06.2009)
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Conference Proceeding