Search Results - "KINDT LOUIS M" :: K.UTB vyhledávací portál

PROTECTION OF PHOTOMASKS FROM 193nm RADIATION DAMAGE USING THIN COATINGS OF ALD Al2O3

by Faure, Thomas B, Guha, Supratik, Bartlau, Peter H, Wagner, Alfred, Sandstrom, Robert L, Kiewra, Edward W, Kindt, Louis M
Year of Publication 24.09.2020

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Method and apparatus for sub-pellicle defect reduction on photomasks

by BURNHAM JAY S, HOULE FRANCES A, KINDT LOUIS M
Year of Publication 24.06.2014

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Process and apparatus for minimizing thermal gradients across an advanced lithographic mask

by KINDT LOUIS M
Year of Publication 07.11.2006

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Process and apparatus for minimizing thermal gradients across an advanced lithographic mask

by Kindt, Louis M
Year of Publication 07.11.2006

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Process and apparatus for minimizing thermal gradients across an advanced lithographic mask

by KINDT LOUIS M
Year of Publication 18.03.2004

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METHOD AND APPARATUS FOR SUB-PELLICLE DEFECT REDUCTION ON PHOTOMASKS

by BURNHAM JAY S, HOULE FRANCES A, KINDT LOUIS M
Year of Publication 02.08.2012

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Method and apparatus for sub-pellicle defect reduction on photomasks

by Burnham, Jay S, Houle, Frances A, Kindt, Louis M
Year of Publication 08.05.2012

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Method and apparatus for sub-pellicle defect reduction on photomasks

by BURNHAM JAY S, HOULE FRANCES A, KINDT LOUIS M
Year of Publication 08.05.2012

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System and method for storing and transporting photomasks in fluid

by Gallagher, Emily F, Kindt, Louis M
Year of Publication 26.05.2009

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System and method for storing and transporting photomasks in fluid

by GALLAGHER EMILY F, KINDT LOUIS M
Year of Publication 26.05.2009

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LIGHT SCATTERING EUVL MASK

by GALLAGHER, EMILY, E, THIEL, CAREY, W, KINDT, LOUIS, M
Year of Publication 30.11.2011

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METHOD AND APPARATUS FOR SUB-PELLICLE DEFECT REDUCTION ON PHOTOMASKS

by BURNHAM JAY S, HOULE FRANCES A, KINDT LOUIS M
Year of Publication 15.07.2010

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SYSTEM AND METHOD FOR STORING AND TRANSPORTING PHOTOMASKS IN FLUID

by GALLAGHER EMILY E, KINDT LOUIS M
Year of Publication 09.08.2007

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Device and method for storing and transporting photomasks

by GALLAGHER EMILY F.,KINDT LOUIS M
Year of Publication 01.08.2007

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System And Method For Storing And Transporting Photomasks In Fluid

by GALLAGHER EMILY F, KINDT LOUIS M
Year of Publication 26.07.2007

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Method for controlling linewidth in advanced lithography masks using electrochemistry

by THIEL CAREY W, KINDT LOUIS M
Year of Publication 23.05.2006

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Method for controlling linewidth in advanced lithography masks using electrochemistry

by Kindt, Louis M, Thiel, Carey W
Year of Publication 23.05.2006

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METHOD FOR CONTROLLING LINEWIDTH IN ADVANCED LITHOGRAPHY MASKS USING ELECTROCHEMISTRY

by THIEL CAREY W, KINDT LOUIS M
Year of Publication 19.05.2005

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Method for adjusting lithographic mask flatness using thermally induced pellicle stress

by SLINKMAN JAMES A, GALLAGHER EMILY F, WISTRON RICHARD E, KINDT LOUIS M
Year of Publication 02.11.2010

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Method for adjusting lithographic mask flatness using thermally induced pellicle stress

by Gallagher, Emily F, Kindt, Louis M, Slinkman, James A, Wistron, Richard E
Year of Publication 02.11.2010

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