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"KIM HUNG-EIL"
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"KIM HUNG-EIL"
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Method of forming an electronic device including forming features within a mask and a selective removal process
by
LUKANC TODD
,
KIM HUNG
-
EIL
Year of Publication
23.08.2011
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Method of forming an electronic device including forming features within a mask and a selective removal process
by
Lukanc, Todd
,
Kim
,
Hung
-
Eil
Year of Publication
23.08.2011
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Patent
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Mask CD measurement monitor outside of the pellicle area
by
Kim
,
Hung
-
eil
Year of Publication
09.09.2008
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Mask CD measurement monitor outside of the pellicle area
by
KIM HUNG
-
EIL
Year of Publication
09.09.2008
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Patent
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METHOD OF FORMING AN ELECTRONIC DEVICE INCLUDING FORMING FEATURES WITHIN A MASK AND A SELECTIVE REMOVAL PROCESS
by
LUKANC TODD
,
KIM HUNG
-
EIL
Year of Publication
20.08.2009
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Method of verifying an optical proximity correction (OPC) model
by
Kim
,
Hung
-
Eil
Year of Publication
20.06.2006
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Method of verifying an optical proximity correction (OPC) model
by
KIM HUNG
-
EIL
Year of Publication
20.06.2006
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Method and system for determining flow rates for contact formation
by
KIM HUNG
-
EIL
Year of Publication
02.11.2004
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Method and system for determining flow rates for contact formation
by
Kim
,
Hung
-
Eil
Year of Publication
02.11.2004
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Photoresist mask, method for making same, and phase shift mask
by
KIM
,
HUNG
-
EIL
Year of Publication
21.09.2003
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ALTERNATING PHASE SHIFT MASK
by
KIM
,
HUNG
-
EIL
Year of Publication
12.09.2003
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12
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Photoresist mask that combines attenuated and alternating phase shifting masks
by
Kim
,
Hung
-
Eil
Year of Publication
15.07.2003
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Photoresist mask that combines attenuated and alternating phase shifting masks
by
KIM HUNG
-
EIL
Year of Publication
15.07.2003
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Accurate contact critical dimension measurement using variable threshold method
by
KIM HUNG
-
EIL
Year of Publication
17.06.2003
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Accurate contact critical dimension measurement using variable threshold method
by
Kim
,
Hung
-
Eil
Year of Publication
17.06.2003
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16
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Tri-tone mask process for dense and isolated patterns
by
Kim
,
Hung
-
Eil
Year of Publication
10.06.2003
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Tri-tone mask process for dense and isolated patterns
by
KIM HUNG
-
EIL
Year of Publication
10.06.2003
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Dark field trench in an alternating phase shift mask to avoid phase conflict
by
Kim
,
Hung
-
Eil
Year of Publication
20.05.2003
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Dark field trench in an alternating phase shift mask to avoid phase conflict
by
KIM HUNG
-
EIL
Year of Publication
20.05.2003
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20
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ALTERNATING PHASE SHIFT MASK
by
KIM
,
HUNG
-
EIL
Year of Publication
07.11.2002
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Patent
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