Formation of low pressure chemically vapour deposited W thin film on silicon dioxide for gate electrode application
Jae Hyun Sone, Kim, Sun-Oo, Kim, Ki-Joan, Hyoung Sub Kim, Hyeong Joon Kim
Published in Thin solid films (15.12.1994)
Published in Thin solid films (15.12.1994)
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Conference Proceeding
Journal Article
Electrical properties of the p+-gate electrode of an a-Si/poly-Si double layer
Kim, Sun-Oo, Kim, Ki-Joon, Kim, Hyoung Sub, Kang, Sug Bong, Sone, Jae Hyun, Byun, Jeong Soo, Kim, Hyeong Joon
Published in Thin solid films (15.12.1994)
Published in Thin solid films (15.12.1994)
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Conference Proceeding
Journal Article
Silicided semiconductor structure and method of forming the same
Yan Jiang, Schruefer Klaus, Lindsay Richard, Haffner Henning, Kim Sun-Oo, Huebinger Frank
Year of Publication 06.09.2016
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Year of Publication 06.09.2016
Patent