METHOD FOR SETTING PLASMA CHAMBER HAVING AN ADAPTIVE PLASMA SOURCE, PLASMA ETCHING METHOD USING THE SAME AND MANUFACTURING METHOD FOR ADAPTIVE PLASMA SOURCE
KIM, NAM HEON, SONG, YEONG SU, OH, SANG RYONG, OH, YOUNG KUN, LEE, DO HYUNG, KIM, SHEUNG KI
Year of Publication 13.09.2006
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Year of Publication 13.09.2006
Patent
METHOD FOR SETTING PLASMA CHAMBER HAVING AN ADAPTIVE PLASMA SOURCE, PLASMA ETCHING METHOD USING THE SAME AND MANUFACTURING METHOD FOR ADAPTIVE PLASMA SOURCE
KIM, NAM HEON, SONG, YEONG SU, OH, SANG RYONG, OH, YOUNG KUN, LEE, DO HYUNG, KIM, SHEUNG KI
Year of Publication 07.07.2005
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Year of Publication 07.07.2005
Patent