First Wafer Effect of Multiple SiO2/SiN Stack Layers Prepared by using Plasma-enhanced Chemical Vapor Deposition
Kim, Min Su, Kwon, Hojoong, Kim, Hyoyoung, Park, Seung-ho, Lee, Jeong Woo, Na, Kyung Pil, Kong, Chul Min, Kim, Yong Gab
Published in Journal of the Korean Physical Society (01.05.2020)
Published in Journal of the Korean Physical Society (01.05.2020)
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