Influence of plasma parameters on low-k SiCOH film grown by plasma-enhanced chemical vapor deposition using dimethyldimethoxysilane
Choi, Jinseok, Yeom, H.J., Chae, Gwang-Seok, Kee, Wonchul, Kim, Kwan-Yong, Lee, Hyo-Chang, Jeong, Hyun-Dam, Kim, Jung-Hyung
Published in Vacuum (01.11.2023)
Published in Vacuum (01.11.2023)
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Journal Article
Investigating the Effect of Plasma Parameters on the Dielectric Constant of Sicoh Thin Films Grown by PECVD Using Dimethyldimethoxysilane
Choi, Jinseok, Chae, Gwang-Seok, Yeom, H.J., Kee, Wonchul, Lee, Hyo-Chang, Jeong, Hyun-Dam, Kim, Jung-Hyung
Published in Meeting abstracts (Electrochemical Society) (22.12.2023)
Published in Meeting abstracts (Electrochemical Society) (22.12.2023)
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Journal Article