New era of power electronics by SiC power devices evolution
Ino, Kazuhide
Published in Proceedings of International Conference on Planarization/CMP Technology 2014 (01.11.2014)
Published in Proceedings of International Conference on Planarization/CMP Technology 2014 (01.11.2014)
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Conference Proceeding
Gate oxide reliability concerns in gate-metal sputtering deposition process: an effect of low-energy large-mass ion bombardment
Ushiki, Takeo, Yu, Mo-Chiun, Kawai, Kunihiro, Shinohara, Toshikuni, Ino, Kazuhide, Morita, Mizuho, Ohmi, Tadahiro
Published in Microelectronics and reliability (01.03.1999)
Published in Microelectronics and reliability (01.03.1999)
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Journal Article
In situ chamber cleaning using halogenated-gas plasmas evaluated by plasma-parameter extraction
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Conference Proceeding
Journal Article